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Original Articles

A defect-pool model for near-interface states in amorphous silicon thin-film transistors

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Pages 325-336 | Received 11 Jun 1990, Accepted 18 Jun 1990, Published online: 20 Aug 2006

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B. Ruttensperger, G. MÜLler & G. KrÖTz. (1993) Density-of-state distribution and variable-range hopping transport in amorphous silicon prepared by ion bombardment. Philosophical Magazine B 68:2, pages 203-214.
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B. Stannowski, R. E. I. Schropp & A. Nascetti. (1999) High energy-barrier for defect creation in thin-film transistors based on hot-wire amorphous silicon. Applied Physics Letters 75:23, pages 3674-3676.
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B. Stannowski, H. Meiling, A. M. Brockhoff & R. E. I. Schropp. (2011) Thin-Film Transistors based on Hot-Wire Amorphous Silicon on Silicon Nitride. MRS Proceedings 557.
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S.M. GadelRab & S.G. Chamberlain. (1998) Improvement of the reliability of amorphous silicon transistors by conduction-band tail width reduction. IEEE Transactions on Electron Devices 45:10, pages 2179-2186.
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H. Ichinose, Y. Ishizuka, H. Nozaki, A. Furukawa, H. Tango & O. Yoshida. (1996) The bias-annealing effect on a-Si:H photodiode. Journal of Non-Crystalline Solids 198-200, pages 322-325.
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P.S. Gudem & S.G. Chamberlain. (1995) A realistic trap distribution model for numerical simulation of amorphous silicon thin-film transistors and phototransistors. IEEE Transactions on Electron Devices 42:7, pages 1333-1339.
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P. Mei, J.B. Boyce, D.K. Fork, M. Hack, R. Lujan & S.E. Ready. (1995) Poly-Si peripheral circuits and contact properties of laser processed poly-Si thin film transistors. Poly-Si peripheral circuits and contact properties of laser processed poly-Si thin film transistors.
C.M. Fortmann. 1995. Plasma Deposition of Amorphous Silicon-Based Materials. Plasma Deposition of Amorphous Silicon-Based Materials 131 176 .
Zhong Chen & Wenyuan Xu. (1994) Studies of defect states in the interface between SiO2 and a-Si:H films. Thin Solid Films 251:2, pages 96-98.
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P. Mei, J. B. Boyce, M. Hack, R. Lujan, S. E. Ready, D. K. Fork, R. I. Johnson & G. B. Anderson. (1994) Grain growth in laser dehydrogenated and crystallized polycrystalline silicon for thin film transistors. Journal of Applied Physics 76:5, pages 3194-3199.
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P. Mei, G. B. Anderson, J. B. Boyce, D. K. Fork, M. Hack, R. I. Johnson, R. A. Lujan & S. E. Ready. (2011) Considerations for Large Area Fabrication Of Integrated a-Si and Poly-Si TFTs. MRS Proceedings 345.
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P. Mei, G. B. Anderson, J. B. Boyce, D. K. Fork, M. Hack, R. I. Johnson, R. A. Lujan & S. E. Ready. (2011) Considerations for Large Area Fabrication of Integrated a-Si and Poly-Si TFTs. MRS Proceedings 336.
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S.C. Deane & M.J. Powell. (2011) Understanding of Thin Film Transistor Electrical Measurements in the Light of the Defect Pool Model. MRS Proceedings 336.
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V. Suntharalingam, C.M. Fortmann, S.J. Fonash & F.A. Rubinelli. (1994) The p/i interface layer in amorphous silicon solar cells: a numerical modeling study. The p/i interface layer in amorphous silicon solar cells: a numerical modeling study.
S. C. Deane & M. J. Powell. (1993) Field-effect conductance in amorphous silicon thin-film transistors with a defect pool density of states. Journal of Applied Physics 74:11, pages 6655-6666.
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S.C. Deane & M.J. Powell. (1993) Defect-pool model parameters for amorphous silicon derived from field-effect measurements. Journal of Non-Crystalline Solids 164-166, pages 323-326.
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S. C. Deane, F. J. Clough, W. I. Milne & M. J. Powell. (1993) The role of the gate insulator in the defect pool model for hydrogenated amorphous silicon thin film transistor characteristics. Journal of Applied Physics 73:6, pages 2895-2901.
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M. J. Powell, C. van Berkel, A. R. Franklin, S. C. Deane & W. I. Milne. (1992) Defect pool in amorphous-silicon thin-film transistors. Physical Review B 45:8, pages 4160-4170.
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K. J. B. M. Nieuwesteeg, J. Boogaard, G. Oversluizen & M. J. Powell. (1992) Current-stress induced asymmetry in hydrogenated amorphous silicon n - i - n devices . Journal of Applied Physics 71:3, pages 1290-1297.
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M. J. Powell, S. C. Deane & W. I. Milne. (1992) Bias-stress-induced creation and removal of dangling-bond states in amorphous silicon thin-film transistors. Applied Physics Letters 60:2, pages 207-209.
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N. H. Nickel, W. Fuhs, H. Mell & W. Beyer. (2011) Silicon-Nitride for Amorphous Silicon Thin-Film Transistors. MRS Proceedings 284.
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G. Fortunato & L. Mariucci. (2011) Instability in Amorphous Silicon Dioxide/Amorphous Silicon Structures. MRS Proceedings 284.
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S. S. He, D. J. Stephens, R. W. Hamaker & G. Lucovsky. (2011) Channel Layer Surface Modifications in a-Si:II thin Film Transistors With Oxide/Nitride Dielectric Layers. MRS Proceedings 282.
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P. Foglietti, G. Fortunato, L. Mariucci & V. Parisi. (2011) Instability in a-Si:H Thin-Film Transistor: A New Method to Discriminate Between Charge Injection and Defect Creation. MRS Proceedings 258.
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T. Globus, M. Shur & M. Hack. (2011) Studies of the Stability of Amorphous Silicon Thin Film Transistors. MRS Proceedings 258.
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G. M�ller & G. Kr�tz. (1992) Defects and impurities in amorphous semiconductors and in liquid electrolytes. Applied Physics A Solids and Surfaces 54:1, pages 40-46.
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J. Kanicki, C. Godet & A. V. Gelatos. (2011) Bias Stress Induced Instabilities in Amorphous Silicon Nitride / Crystalline Silicon and Amorphous Silicon Nitride / Amorphous Silicon Structures. MRS Proceedings 219.
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S. C. Deane, W. I. Milne & M. J. Powell. (2011) Reduction of Threshold Voltage Shift by Bias Annealing of Hydrogenated Amorphous Silicon Thin Film Transistors. MRS Proceedings 219.
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N. Nickel, W. Fuhs & H. Mell. (1991) TCS study of n- and p-channel amorphous silicon thin-film transistors. Journal of Non-Crystalline Solids 137-138, pages 1221-1224.
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M.J. Powell, C Van Berkel & S.C. Deane. (1991) Instability mechanisms in amorphous silicon thin film transistors and the role of the defect pool. Journal of Non-Crystalline Solids 137-138, pages 1215-1220.
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