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Original Articles

Technological Development of Advanced Asymmetric Magnetic Soft Mold Micro-Imprint Lithography

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Pages 713-717 | Published online: 15 Jun 2010

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Yung-Chun Weng, Yung-Jin Weng & Sen-Yeu Yang. (2011) Electromagnetic Field-Aided Magnetic Soft Mold Reverse Imprinting Technology Applied in Microstructure Replication. Polymer-Plastics Technology and Engineering 50:11, pages 1077-1083.
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Articles from other publishers (8)

Ming-Huai Hsu, Yao-Yang Tsai & Sen-Yeu Yang. (2022) Induction heating ferromagnetic particles embedded PDMS mold for microstructure embossing. Journal of Physics Communications 6:2, pages 025002.
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Y. J. Weng. (2015) UV-Curable Technique of Magnetic Roller Soft Mold and Microstructure Pattern Replication. International Polymer Processing 30:1, pages 63-69.
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Y.‐C. Weng, Y.‐J. Weng & S.‐Y. Yang. (2012) The application of elastic auxiliary air bag imprinting technology to the development of linear gradient micro‐structure replication processes. Polymers for Advanced Technologies 24:1, pages 1-6.
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Y.-J. Weng. (2012) Application of Dry Nano Powder Inverse Imprint Technology in Transferring and Replication of Micro Patterns. International Polymer Processing 27:1, pages 105-110.
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Y.-J. Weng. (2011) Direct Imprinting Using Magnetic Nickel Mold and Electromagnetism Assisted Pressure for Replication of Microstructures. International Polymer Processing 26:5, pages 484-489.
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Y-J Weng, J-C Huang & T-L Chen. (2011) Development of an innovative magnetic-aided roller microtransfer replica process and a study of microstructure array replication. Proceedings of the Institution of Mechanical Engineers, Part C: Journal of Mechanical Engineering Science 225:11, pages 2749-2758.
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Yung Chun Weng, Yung Jin Weng, Huang Sheng Fang & Sen Yeu Yang. (2011) Electromagnetic Imprint Technique Combined with Electrophoretic Deposition Technique in Forming Microelectrode Structures. Japanese Journal of Applied Physics 50:4R, pages 046502.
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Yung Jin Weng, Yung Chun Weng, Hsu Kang Liu & Lin Hsiung Chiu. (2010) Deformation Mode Construction Using Photoresist Microstructure Devices Produced with Nanoindention Technology. Key Engineering Materials 447-448, pages 539-543.
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