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Peer-Reviewed Articles…

A Comparative Risk Assessment of Casting Solvents for Positive Photoresist

Pages 81-87 | Received 14 Mar 1988, Accepted 12 Sep 1988, Published online: 25 Feb 2011

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EdwardT. Zellers & Robert Sulewski. (1992) Glove Permeation by Propylene Glycol Monomethyl Ether Acetate — A Photoresist Solvent Used in Semiconductor Device Processing. Applied Occupational and Environmental Hygiene 7:6, pages 392-397.
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GregM. Piacitelli, DavidM. Votaw & E. Radha Krishnan. (1990) An Exposure Assessment of Industries using Ethylene Glycol Ethers. Applied Occupational and Environmental Hygiene 5:2, pages 107-114.
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Articles from other publishers (6)

Rainer Leuschner & Georg Pawlowski. 2006. Materials Science and Technology. Materials Science and Technology.
. 2002. The MAK‐Collection for Occupational Health and Safety. The MAK‐Collection for Occupational Health and Safety 1 11 .
Rainer Leuschner & Georg Pawlowski. 2000. Handbook of Semiconductor Technology Set. Handbook of Semiconductor Technology Set 177 263 .
Rainer Leuschner & Georg Pawlowski. 2000. Handbook of Semiconductor Technology. Handbook of Semiconductor Technology 177 263 .
Marilyn F. Hallock, S. Katharine Hammond, Cynthia J. Hines, Susan R. Woskie & Marc B. Schenker. (2010) Patterns of chemical use and exposure control in the semiconductor health study. American Journal of Industrial Medicine 28:6, pages 681-697.
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Reiner Schmidt, Horst Scheufler, Siegfried Bauer, Lona Wolff, Matthias Pelzing & Rainer Herzschuh. (2016) Toxicological Investigations in the Semiconductor Industry. Toxicology and Industrial Health 11:1, pages 49-61.
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