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Original Articles

Optical characterization of double layers containing epitaxial ZnSe and ZnTe films

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Pages 583-602 | Received 17 Dec 2003, Published online: 20 Feb 2007

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Ivan Ohlídal & David Nečas. (2008) Influence of shadowing on ellipsometric quantities of randomly rough surfaces and thin films. Journal of Modern Optics 55:7, pages 1077-1099.
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Articles from other publishers (8)

Ivan Ohlídal, Martin Čermák & Jiří Vohánka. 2018. Optical Characterization of Thin Solid Films. Optical Characterization of Thin Solid Films 271 313 .
Ivan Ohlídal, Daniel Franta & David Nečas. (2017) Ellipsometric and reflectometric characterization of thin films exhibiting thickness non-uniformity and boundary roughness. Applied Surface Science 421, pages 687-696.
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Ivan Ohlídal, Jiří Vohánka, Martin Čermák & Daniel Franta. (2017) Optical characterization of randomly microrough surfaces covered with very thin overlayers using effective medium approximation and Rayleigh–Rice theory. Applied Surface Science 419, pages 942-956.
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D Nečas, I Ohlídal, D Franta, M Ohlídal & J Vodák. (2016) Simultaneous determination of optical constants, local thickness and roughness of ZnSe thin films by imaging spectroscopic reflectometry. Journal of Optics 18:1, pages 015401.
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David Nečas, Ivan Ohlídal, Jiří Vodák, Miloslav Ohlídal & Daniel Franta. Simultaneous determination of optical constants, local thickness, and local roughness of thin films by imaging spectroscopic reflectometry. Simultaneous determination of optical constants, local thickness, and local roughness of thin films by imaging spectroscopic reflectometry.
David Nečas, Ivan Ohlídal, Daniel Franta, Miloslav Ohlídal, Vladimír Čudek & Jiří Vodák. (2014) Measurement of thickness distribution, optical constants, and roughness parameters of rough nonuniform ZnSe thin films. Applied Optics 53:25, pages 5606.
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David Nečas & Ivan Ohlídal. (2014) Consolidated series for efficient calculation of the reflection and transmission in rough multilayers. Optics Express 22:4, pages 4499.
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Arthur Tay. (2006) Simple tilt and height location monitoring of wafers. Optical Engineering 45:5, pages 053603.
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