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Numerical Heat Transfer, Part A: Applications
An International Journal of Computation and Methodology
Volume 19, 1991 - Issue 1
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Original Articles

EFFECTS OF THERMAL RADIATION ON MOMENTUM, HEAT, AND MASS TRANSFER IN A HORIZONTAL CHEMICAL VAPOR DEPOSITION REACTOR

Percy B. Chinoy Department of Chemical Engineering, Rensselaer Polytechnic Institute, Troy, New York, 12180
,
Deborah A. Kaminski Department of Mechanical Engineering, Aeronautical Engineering and Mechanics, Rensselaer Polytechnic Institute, Troy, New York, 12180
&
Sorab K. Ghandhi Electrical, Computer and Systems Engineering Department, Rensselaer Polytechnic Institute, Troy, New York, 12180
Pages 85-100 | Received 06 Apr 1990, Accepted 25 May 1990, Published online: 13 Jul 2010

Citations (12)

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Read on this site (2)

Wei Huang & WilsonK. S. Chiu. (2006) Heat and Mass Transfer in a CVD Optical Fiber Coating Process by Propane Precursor Gas. Numerical Heat Transfer, Part A: Applications 50:2, pages 147-163.
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Tien-Mo Shih & MichaelM. Ohadi. (1993) LITERATURE SURVEY ON NUMERICAL HEAT TRANSFER (1990-1991). Numerical Heat Transfer, Part A: Applications 23:2, pages 129-169.
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Articles from other publishers (10)

Muhammad Naqib Osman, Mohd Hanafi AniSyed Noh Syed Abu Bakar. (2020) Substrate Placement inside CVD Tube for Graphene Production. Materials Science Forum 981, pages 84-91.
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Hoseon Yoo & Yogesh Jaluria. (2002) Thermal Aspects in the Continuous Chemical Vapor Deposition of Silicon. Journal of Heat Transfer 124:5, pages 938-946.
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Wilson K. S. Chiu, Cristy J. Richards & Yogesh Jaluria. (2001) Experimental and Numerical Study of Conjugate Heat Transfer in a Horizontal Channel Heated From Below. Journal of Heat Transfer 123:4, pages 688-697.
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F. Durst, L. Kadinski, Yu.N. Makarov, M. Sch?fer, M.G. Vasil'ev & V.S. Yuferev. (1997) Advanced mathematical models for simulation of radiative heat transfer in CVD reactors. Journal of Crystal Growth 172:3-4, pages 389-395.
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L. Kadinski & M. Peri?. (1996) Numerical study of grey?body surface radiation coupled with fluid flow for general geometries using a finite volume multigrid solver. International Journal of Numerical Methods for Heat & Fluid Flow 6:3, pages 3-18.
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F. Durst, L. Kadinski & M. Schäfer. (1995) A multigrid solver for fluid flow and mass transfer coupled with grey-body surface radiation for the numerical simulation of chemical vapor deposition processes. Journal of Crystal Growth 146:1-4, pages 202-208.
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L. Kadinski, Yu.N. Makarov, M. Schäfer, M.G. Vasil'ev & V.S. Yuferev. (1995) Development of advanced mathematical models for numerical calculations of radiative heat transfer in metalorganic chemical vapour deposition reactors. Journal of Crystal Growth 146:1-4, pages 209-213.
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Kun-Ho Lie, Tushar P. Merchant & Klavs F. Jensen. (2011) Simulation of Rapid Thermal Processing Equipment and Processes. MRS Proceedings 303.
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Yu-Hua Lee & Kan-Sen Chou. (1992) Modelling of growth rate uniformity of CdTe epilayer by MOCVD. Journal of Electronic Materials 21:1, pages 87-92.
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C.R. Kleijn. (1991) On the modelling of transport phenomena in chemical vapour deposition and its use in reactor design and process optimization. Thin Solid Films 206:1-2, pages 47-53.
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