Publication Cover
Radiation Effects and Defects in Solids
Incorporating Plasma Science and Plasma Technology
Volume 116, 1991 - Issue 1-2
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Original Articles

Radiation damage and electron radiation induced recovery in ZnTe

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Pages 81-94 | Received 26 Sep 1990, Accepted 12 Oct 1990, Published online: 19 Aug 2006

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Read on this site (2)

G. Lu. (1993) Ar+-ion milling of II-VI semiconducting materials. Philosophical Magazine Letters 68:1, pages 1-4.
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G. Lu. (1992) Formation and growth of dislocation loops in ZnTe under irradiation of low energy Ar+-Ions. Radiation Effects and Defects in Solids 124:3, pages 301-312.
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Articles from other publishers (8)

Adib J. Samin & James C. Petrosky. (2022) An analysis of point defects in ZnTe using density functional theory calculations. Journal of Alloys and Compounds 921, pages 166017.
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Young Min Park, Dong-Su Ko, Kyung-Woo Yi, Ivan Petrov & Young-Woon Kim. (2007) Measurement and estimation of temperature rise in TEM sample during ion milling. Ultramicroscopy 107:8, pages 663-668.
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Changzhen Wang, David J. Smith, Steve Tobin, Themis Parodos, Jun Zhao, Yong Chang & Sivalingam Sivananthan. (2006) Understanding ion-milling damage in Hg1−xCdxTe epilayers. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 24:4, pages 995-1000.
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K. Bharuth-Ram, M. Restle & H. Hofsäss. (1998) Annealing behavior of ZnTe investigated with 111mCd-emission channeling. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 136-138, pages 751-755.
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Árpád Barna & Béla Pécz. 1996. Handbook of Microscopy. Handbook of Microscopy 751 801 .
. 1996. Handbook of Microscopy Set. Handbook of Microscopy Set 751 801 .
Yu. Yu. Loginov & G. Lu. (1996) Electron microscope studies of the influence of electrons with subthreshold energies on the formation and annealing of structural defects in ZnTe and CdZnTe. Russian Physics Journal 39:1, pages 102-106.
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David J. Barber. (1993) Radiation damage in ion-milled specimens: characteristics, effects and methods of damage limitation. Ultramicroscopy 52:1, pages 101-125.
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