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Original Articles

Electrochemical Mechanical Polishing of Copper with High Permittivity Abrasives

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Pages 207-212 | Received 23 Aug 2011, Accepted 02 Jan 2012, Published online: 05 Feb 2013

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Articles from other publishers (3)

Chenxu Liu, Yu Tian & Yonggang Meng. (2021) A Chemical Potential Equation for Modeling Triboelectrochemical Reactions on Solid–Liquid Interfaces. Frontiers in Chemistry 9.
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Di Wu, Renke Kang, Lin Niu, Bo Pan, Zuotao Liu & Jiang Guo. (2019) Two-Step Electrochemical Mechanical Polishing of Pure Copper. ECS Journal of Solid State Science and Technology 8:11, pages P699-P703.
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Chloé Rotty, Marie-Laure Doche, Audrey Mandroyan, Jean-Yves Hihn, Ghislain Montavon & Virginie Moutarlier. (2017) Comparison of electropolishing behaviours of TSC, ALM and cast 316L stainless steel in H3PO4/H2SO4. Surfaces and Interfaces 6, pages 170-176.
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