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Applied Occupational and Environmental Hygiene Volume 6, 1991 - Issue 9
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Articles

Assessment of Extremely Low Frequency (ELF) Electric and Magnetic Fields in Microelectronics Fabrication Rooms

Frank S. Rosenthal School of Health Sciences, Purdue University, West Lafayette, Indiana, 49707, USA
&
Sassan Abdollahzadeh Department of Family and Community Medicine, University of Massachusetts Medical School, Worcester, Massachusetts, 01655, USA
Pages 777-784 | Received 26 Sep 1990, Accepted 22 Mar 1991, Published online: 24 Feb 2011

Citations (11)

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Read on this site (3)

Farhang Akbar-Khanzadeh & JefferyR. Huffman. (1995) Office Workers' Exposure to Extremely Low Frequency (ELF) Magnetic Fields and Their Perception of Characteristics and Health Effects of ELF Electromagnetic Fields. Applied Occupational and Environmental Hygiene 10:11, pages 927-933.
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ThurmanB. Wenzl, David Kriebel, EllenA. Eisen & Rafael Moure-Eraso. (1995) A Comparison of Two Methods for Estimating Average Exposure to Power-Frequency Magnetic Fields. Applied Occupational and Environmental Hygiene 10:2, pages 125-130.
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MarilynF. Hallock, S. Katharine Hammond, Elaina Kenyon, ThomasJ. Smith & EmilR. Smith. (1993) Assessment of Task and Peak Exposures to Solvents in the Microelectronics Fabrication Industry. Applied Occupational and Environmental Hygiene 8:11, pages 945-954.
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Articles from other publishers (8)

Ju-Hyun Park, Sangjun Choi, Dong-Hee Koh, Jihoon Park, Won Kim & Dong-Uk Park. (2023) Characteristics of Peak Exposure of Semiconductor Workers to Extremely Low-Frequency Magnetic Fields. Annals of Work Exposures and Health 67:4, pages 508-517.
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Phoka C. Rathebe. (2021) Emission of ELF Electromagnetic Fields from Automated-Powered Equipment Used in Detergent Manufacturing Plant. Emission of ELF Electromagnetic Fields from Automated-Powered Equipment Used in Detergent Manufacturing Plant.
Sangjun Choi, Wonseok Cha, Jihoon Park, Seungwon Kim, Won Kim, Chungsik Yoon, Ju-Hyun Park, Kwonchul Ha & Donguk Park. (2018) Extremely Low Frequency-Magnetic Field (ELF-MF) Exposure Characteristics among Semiconductor Workers. International Journal of Environmental Research and Public Health 15:4, pages 642.
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Donguk Park. (2016) Review of Hazardous Agent Level in Wafer Fabrication Operation Focusing on Exposure to Chemicals and Radiation. Journal of Korean Society of Occupational and Environmental Hygiene 26:1, pages 1-10.
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Javier Vila, Joseph D Bowman, Lesley Richardson, Laurel Kincl, Dave L Conover, Dave McLean, Simon Mann, Paolo Vecchia, Martie van Tongeren & Elisabeth Cardis. (2016) A Source-based Measurement Database for Occupational Exposure Assessment of Electromagnetic Fields in the INTEROCC Study: A Literature Review Approach. Annals of Work Exposures and Health 60:2, pages 184-204.
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David G. Baldwin & Michael E. Williams. 1998. Semiconductor Safety Handbook. Semiconductor Safety Handbook 304 326 .
Michael E. Williams, David G. Baldwin & Paul C. Manz. 1995. Semiconductor Industrial Hygiene Handbook. Semiconductor Industrial Hygiene Handbook 104 139 .
Mishel S. Israel. (1994) Electromagnetic Radiation - Parameters for Risk Assessment. Reviews on Environmental Health 10:2.
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