Patterning of noble metal electrodes and oxygen barriers by CMP

R. F. Schnabel Infineon Technologies, 81730, Munich, Germany

G. Beitel Infineon Technologies, 81730, Munich, Germany

G. Mainka Infineon Technologies, 81730, Munich, Germany; Goethe-University, Marie-Curie-Str. 11, 60439, Frankfurt/M, Germany

A. Sänger Infineon Technologies Dresden, Königsbrücker Str. 180, 01099, Dresden, Germany

P. Bosk Infineon Technologies, 81730, Munich, Germany

Z. Chen EKC Technology, 2520 Barrington Court, Hayward, CA, 94545–1163, USA

R. Small EKC Technology, 2520 Barrington Court, Hayward, CA, 94545–1163, USA

C. Dehm Infineon Technologies, 81730, Munich, Germany

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Patterning of noble metal electrodes and oxygen barriers by CMP

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