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Integrated Ferroelectrics
An International Journal
Volume 68, 2004 - Issue 1
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Original Articles

Laser Treatment at Room Temperature for Improvement of Dielectric Properties in Plasma-Enhanced Atomic Layer Deposited TiO2 Thin Films

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Pages 63-73 | Received 01 Apr 2004, Accepted 01 Jul 2004, Published online: 12 Aug 2010

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G. X. LIU, F. K. SHAN, W. J. LEE, G. H. LEE, I. S. KIM & B. C. SHIN. (2006) NANOMIXED TiO2-Ga2O3 THIN FILMS GROWN BY PLASMA ENHANCED ATOMIC LAYER DEPOSITION (PEALD) METHOD. Integrated Ferroelectrics 85:1, pages 155-164.
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Articles from other publishers (2)

Jieun Lee, In S. Kim, Moon-Hyun Hwang & Kyu-Jung Chae. (2020) Atomic layer deposition and electrospinning as membrane surface engineering methods for water treatment: a short review. Environmental Science: Water Research & Technology 6:7, pages 1765-1785.
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H. B. Profijt, S. E. Potts, M. C. M. van de Sanden & W. M. M. Kessels. (2011) Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 29:5.
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