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Integrated Ferroelectrics
An International Journal
Volume 139, 2012 - Issue 1
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Original Articles

Influence of Oxygen Pressure on Structures and Electrical Properties of Lead-free (K0.44Na0.52Li0.04)(Nb0.86Ta0.10Sb0.04)O3 Thin Films Deposited by Pulsed Laser Deposition

Aifen Tian Electronic Material Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, Xi’an Jiaotong University, Xi’an, 710049, China; School of Material Science and Engineering, Xi’an University of Science and Technology, Xi’an, 710054, China
,
Wei Ren Electronic Material Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, Xi’an Jiaotong University, Xi’an, 710049, China
,
Peng Shi Electronic Material Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, Xi’an Jiaotong University, Xi’an, 710049, China
,
Xiaoqing Wu Electronic Material Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, Xi’an Jiaotong University, Xi’an, 710049, China
&
Xiaofeng Chen Electronic Material Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, Xi’an Jiaotong University, Xi’an, 710049, China
Pages 14-19 | Received 18 Jun 2012, Accepted 30 Jun 2012, Published online: 19 Dec 2012

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