Advanced search
Publication Cover
Integrated Ferroelectrics
An International Journal
Volume 18, 1997 - Issue 1-4
Submit an article Journal homepage
54
Views
11
CrossRef citations to date
0
Altmetric
Chemical vapor deposition

Measurements of vapor pressures of MOCVD materials, which are usable for ferroelectric thin films

Yutaka Kojima Kojundo Chemical Laboratory Co., Ltd., 5-1-28, Chiyoda, Sakadoshi, Saitrua, Japan
,
Hidekini Kadokura Kojundo Chemical Laboratory Co., Ltd., 5-1-28, Chiyoda, Sakadoshi, Saitrua, Japan
,
Yadokura Okuhara Kojundo Chemical Laboratory Co., Ltd., 5-1-28, Chiyoda, Sakadoshi, Saitrua, Japan
,
Masamichi Matsumoto Kojundo Chemical Laboratory Co., Ltd., 5-1-28, Chiyoda, Sakadoshi, Saitrua, Japan
&
Takayuki Mogi Kojundo Chemical Laboratory Co., Ltd., 5-1-28, Chiyoda, Sakadoshi, Saitrua, Japan
Pages 183-196 | Published online: 19 Aug 2006

Citations (11)

Keep up to date with the latest research on this topic with citation updates for this article.

Subscribe to citation updates

Read on this site (3)

TimothyJ. Leedham, AnthonyC. Jones, HywelO. Davies, NeilL. Tobin, PaulA. Williams, JamieF. Bickley & Alexander Steiner. (2001) Improved precursors for the mocvd of sbt, sbn and sbtn. Integrated Ferroelectrics 36:1-4, pages 111-118.
Read now
Woong-chul Shin, Kyu-jeong Choi, Eun-suck Choi, Chong-man Park & Soon-gil Yoon. (2000) Ferroelectric SrBi2Ta2O9 thin films deposited by liquid injection MOCVD using novel bimetallic alkoxide precursor. Integrated Ferroelectrics 30:1-4, pages 27-36.
Read now
TimothyJ. Leedham, AnthonyC. Jones, PeterJ. Wright, MichaelJ. Crosbie, DennisJ. Williams, HywelO. Davies & Paul O'Brien. (1999) Novel precursors for the MOCVD of ferroelectric thin films. Integrated Ferroelectrics 26:1-4, pages 85-92.
Read now

Articles from other publishers (8)

Fumikazu Mizutani, Shintaro Higashi, Mari Inoue & Toshihide Nabatame. (2019) Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma. AIP Advances 9:4.
Crossref
William AcreeJr.Jr. & James S. Chickos. (2017) Phase Transition Enthalpy Measurements of Organic and Organometallic Compounds and Ionic Liquids. Sublimation, Vaporization, and Fusion Enthalpies from 1880 to 2015. Part 2. C11–C192. Journal of Physical and Chemical Reference Data 46:1.
Crossref
Hirokazu CHIBA, Ken-ichi TADA, Taishi FURUKAWA, Toshiki YAMAMOTO, Tadahiro YOTSUYA, Noriaki OSHIMA & Hiroshi FUNAKUBO. (2016) Low temperature MOCVD of Ta<sub>2</sub>O<sub>5</sub> dielectric thin films from Ta[NC(CH<sub>3</sub>)<sub>3</sub>][OC(CH<sub>3</sub>)<sub>3</sub>]<sub>3</sub> and O<sub>2</sub>. Journal of the Ceramic Society of Japan 124:5, pages 510-514.
Crossref
Savio J. A. Moniz, Christopher S. Blackman, Claire J. Carmalt & Geoffrey Hyett. (2010) MOCVD of crystalline Bi2O3 thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water. Journal of Materials Chemistry 20:36, pages 7881.
Crossref
Hywel O. Davies, Anthony C. Jones, Majid A. Motevalli, Elizabeth A. McKinnell & Paul O’Brien. (2005) Synthesis and structure of a tantalum(V) tetrakis-O,O chelate: [Ta(tmhd)4][TaCl6]. Inorganic Chemistry Communications 8:7, pages 585-587.
Crossref
Woong-Chul Shin & Soon-Gil Yoon. (2001) Compositional Control of Ferroelectric SrBi[sub 2]Ta[sub 2]O[sub 9] Thin Films by Liquid Delivery MOCVD Using a Single Cocktail of Sr[Ta(OEt)[sub 5](dmae)][sub 2] and Bi(C[sub 6]H[sub 5])[sub 3]. Journal of The Electrochemical Society 148:11, pages C762.
Crossref
Mikael Schuisky, Anders Hårsta, Sergey Khartsev & Alex Grishin. (2000) Ferroelectric Bi4Ti3O12 thin films on Pt-coated silicon by halide chemical vapor deposition. Journal of Applied Physics 88:5, pages 2819-2824.
Crossref
A.C Jones, T.J Leedham, P.J Wright, M.J Crosbie, D.J Williams, H.O Davies, K.A Fleeting, P O’Brien & M.E Pemble. (1999) The control of growth dynamics by the use of designed precursors for the MOCVD of electronic ceramics. Materials Science in Semiconductor Processing 2:2, pages 165-171.
Crossref

Reprints and Corporate Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

To request a reprint or corporate permissions for this article, please click on the relevant link below:

Order Reprints Request Corporate Permissions

Academic Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

Obtain permissions instantly via Rightslink by clicking on the button below:

Request Academic Permissions

If you are unable to obtain permissions via Rightslink, please complete and submit this Permissions form. For more information, please visit our Permissions help page.

Related research

People also read lists articles that other readers of this article have read.

Recommended articles lists articles that we recommend and is powered by our AI driven recommendation engine.

Cited by lists all citing articles based on Crossref citations.
Articles with the Crossref icon will open in a new tab.