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Integrated Ferroelectrics
An International Journal
Volume 22, 1998 - Issue 1-4
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Session 7. Testing and characterization

The role of leakge current on the memory window and memory retention in MFIS structure

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Pages 205-211 | Received 07 Apr 1998, Published online: 19 Aug 2006

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In-Kyu You, Won Jae Lee, Il-Suk Yang, Byoung Gon Yu, Kyoung-Ik Cho & Shi-Ho Kim. (2001) Effect of NO(Si3N4/SiO2) layers on the electrical properties of mfisfet using SBT (SrBi2Ta2O9) materials. Integrated Ferroelectrics 33:1-4, pages 177-184.
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K. Arita, T. Otsuki, Z. Chen, M. Lim, J.W. Bacon & C.A. Paz De Araujo. (1999) Electrical properties of Y1-based ferroelectric gate MOS capacitors for nonvolatile memory applications. Integrated Ferroelectrics 27:1-4, pages 19-29.
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Rohit Medwal, Surbhi Gupta, Shojan P. Pavunny, Rajesh K. Katiyar, Reji Thomas & Ram S. Katiyar. (2017) Low-voltage-driven Pt/BiFeO3/DyScO3/p-Si-based metal–ferroelectric–insulator–semiconductor device for non-volatile memory. Journal of Materials Science 53:6, pages 4274-4282.
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Koji Aizawa, Byung-Eun Park, Yoshihito Kawashima, Kazuhiro Takahashi & Hiroshi Ishiwara. (2004) Impact of HfO2 buffer layers on data retention characteristics of ferroelectric-gate field-effect transistors. Applied Physics Letters 85:15, pages 3199-3201.
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Koji Aizawa, Yoshihito Kawashima & Hiroshi Ishiwara. (2011) Long Time Data Retention and A Mechanism in Ferroelectric-Gate Field Effect Transistors with HfO 2 Buffer Layer . MRS Proceedings 830.
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B.K. Moon, H. Ishiwara, E. Tokumitsu & M. Yoshimoto. (2001) Characteristics of ferroelectric Pb(Zr,Ti)O3 films epitaxially grown on CeO2(111)/Si(111) substrates. Thin Solid Films 385:1-2, pages 307-310.
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Sung-Kwan Kang, Dae-Hong Ko, Eun-Ha Kim, Man Ho Cho & C.N. Whang. (1999) Interfacial reactions in the thin film Y2O3 on chemically oxidized Si(100) substrate systems. Thin Solid Films 353:1-2, pages 8-11.
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