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Integrated Ferroelectrics
An International Journal
Volume 25, 1999 - Issue 1-4
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Section F: Materzals and processes for NV Fe RAMS

Hydrogen induced imprint mechanism of Pt/PZT/Pt capacitor by low temperature hydrogen treatment

Hiroyuki Kanaya Microelectronics Engineering Laboratory, Toshiba Corp. Semiconductor Company, 8, Shinsugita-cho, Isogo-ku, Yokohama, 235-8523, Japan
,
Tsuyoshi Iwamoto Corporate Manufacturing Engineering Center, Toshiba Corp., 33, Shinisogo-cho, Isogo-ku, Yokohama, 235-0017, Japan
,
Yukio Takahagi Environmental Engineering & Analysis Center, Toshiba Corp., 8, Shinsugita-cho, Isogo-ku, Yokohama, 235-8523, Japan
,
Iwao Kunishima Microelectronics Engineering Laboratory, Toshiba Corp. Semiconductor Company, 8, Shinsugita-cho, Isogo-ku, Yokohama, 235-8523, Japan
&
Shinichi Tanaka Microelectronics Engineering Laboratory, Toshiba Corp. Semiconductor Company, 8, Shinsugita-cho, Isogo-ku, Yokohama, 235-8523, Japan
Pages 235-244 | Received 07 Mar 1999, Accepted 14 May 1999, Published online: 19 Aug 2006

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