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Original Articles

Electronic properties of amorphous and microcrystalline silicon prepared in a microwave plasma from SiF4

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Pages 533-550 | Received 08 Mar 1991, Accepted 05 Jun 1991, Published online: 20 Aug 2006

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Giovanni Bruno, Pio Capezzuto, Maria M. Giangregorio, Giuseppe V. Bianco & Maria Losurdo. (2009) From amorphous to microcrystalline silicon: Moving from one to the other by halogenated silicon plasma chemistry. Philosophical Magazine 89:28-30, pages 2469-2489.
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D.M. Bhusari, A.S. Kumbhar & S.T. Kshirsagar. (1994) Improved fluorinated hydrogenated amorphous silicon alloys prepared using the hot-plasma-box glow-discharge technique. Philosophical Magazine B 70:2, pages 263-276.
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Articles from other publishers (5)

G. Cicala, P. Capezzuto & G. Bruno. (2001) Microcrystalline silicon by plasma enhanced chemical vapor deposition from silicon tetrafluoride. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 19:2, pages 515-523.
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Jiang-Huai Zhou, Kazuyuki Ikuta, Tetsuji Yasuda, Takahide Umeda, Satoshi Yamasaki & Kazunobu Tanaka. (1997) Growth of amorphous-layer-free microcrystalline silicon on insulating glass substrates by plasma-enhanced chemical vapor deposition. Applied Physics Letters 71:11, pages 1534-1536.
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G. Ganguly & A. Matsuda. (1996) As grown and light soaked defect densities in a-Si:H with sharp band tails. As grown and light soaked defect densities in a-Si:H with sharp band tails.
T. Oshima, K. Yamaguchi, A. Yamada, M. Konagai & K. Takahashi. (2011) Improvement of film Quality of A-Si:H Deposited by Photo-CVD using SiH 2 Cl 2 . MRS Proceedings 336.
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A. Mireshghi, W.S. Hong, J. Drewery, T. Jing, S.N. Kaplan, H.K. Lee & V. Perez-Mendez. (2011) Improved Electrical and Transport Characteristics of Amorphous Silicon by Enriching with Microcrystalline Silicon. MRS Proceedings 336.
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