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Original Articles

Oxygen enhancement of 1-54 μm Er3+ luminescence in hydrogenated amorphous silicon

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Pages 137-145 | Received 06 Jan 1997, Accepted 22 May 1997, Published online: 13 Aug 2009

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M. Kechouane, N. Beldi, O. Mouheb, T. Mohammed-Brahim, A.S. Barriere, H. L'Haridon & M. Gauneau. (1999) Erbium-doped hydrogenated amorphous silicon prepared by dc sputtering. Philosophical Magazine B 79:8, pages 1205-1211.
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Articles from other publishers (3)

R. Cherfi, A. Abdelmoumene, M. Kechouane, A. Rahal, M. Aoucher & T. Mohammed‐Brahim. (2009) Deposition temperature effects on the characteristics of a‐Si:H deposited by pulsed DC magnetron sputtering. physica status solidi (a) 206:7, pages 1504-1509.
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M. Kechouane, D. Biggemen & L. R. Tessler. (2004) 1.54 μm luminescence quenching of erbium‐doped hydrogeated amorphous silicon deposited by D.C. magnetron sputtering. physica status solidi (c) 1:2, pages 285-289.
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H. Kühne, G. Weiser, E. I. Terukov, A. N. Kusnetsov & V. Kh. Kudoyarova. (1999) Resonant nonradiative energy transfer to erbium ions in amorphous hydrogenated silicon. Journal of Applied Physics 86:2, pages 896-901.
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