Sensitization mechanisms of a multi-substituted isoindolomethene in a photopolymer coating layer: the effect on the sensitization mechanisms incorporating the bicyclo[2,2,2]octene group into bipyrromethene

T UranoResearch Centre, Mitsubishi Kagaku Corporation, Yokohama, Japan;Centre for Cooperative Research, Chiba University, Chiba, Japan

E Ohno-OkumuraResearch Institute of Chemical Science, Technology and Education, Chiba-ken, Japan

K SakamotoDepartment of Industrial Chemistry, College of Industrial Technology, Nihon University, Chiba-ken, Japan

M WadaDepartment of Chemistry, Faculty of Science, Ehime-ken, Japan

S ItoDepartment of Chemistry, Faculty of Science, Ehime-ken, Japan

N OnoDepartment of Chemistry, Faculty of Science, Ehime-ken, Japan

S SuzukiDepartment of Chemistry, Faculty of Science, Ehime-ken, Japan

T YamaokaDepartment of Information and Image Science, Faculty of Engineering, Chiba University, Chiba, Japan

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Sensitization mechanisms of a multi-substituted isoindolomethene in a photopolymer coating layer: the effect on the sensitization mechanisms incorporating the bicyclo[2,2,2]octene group into bipyrromethene

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Sensitization mechanisms of a multi-substituted isoindolomethene in a photopolymer coating layer: the effect on the sensitization mechanisms incorporating the bicyclo[2,2,2]octene group into bipyrromethene

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