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Philosophical Magazine Volume 87, 2007 - Issue 35
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Original Articles

Investigation of the microstructure and optical properties of hydrogenated polymorphous silicon films prepared with pure silane

S. B. Li School of Optoelectronic Information, University of Electronic Science and Technology of China (UESTC), State Key Lab of Electronic Thin Films and Integrated Devices, Chengdu 610054, P. R. ChinaCorrespondence[email protected]
,
Z. M. Wu School of Optoelectronic Information, University of Electronic Science and Technology of China (UESTC), State Key Lab of Electronic Thin Films and Integrated Devices, Chengdu 610054, P. R. China
,
W. Li School of Optoelectronic Information, University of Electronic Science and Technology of China (UESTC), State Key Lab of Electronic Thin Films and Integrated Devices, Chengdu 610054, P. R. China
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N. M. Liao School of Optoelectronic Information, University of Electronic Science and Technology of China (UESTC), State Key Lab of Electronic Thin Films and Integrated Devices, Chengdu 610054, P. R. China
&
Y. D. Jiang School of Optoelectronic Information, University of Electronic Science and Technology of China (UESTC), State Key Lab of Electronic Thin Films and Integrated Devices, Chengdu 610054, P. R. China
Pages 5539-5549 | Received 07 May 2007, Accepted 04 Sep 2007, Published online: 12 Nov 2007

Citations (3)

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Read on this site (1)

Jing Jiang, Shibin Li, Yadong Jiang, Zhiming Wu, Zhanfei Xiao & Yuanjie Su. (2012) Enhanced ultraviolet to near-infrared absorption by two-tier structured silicon formed by simple chemical etching. Philosophical Magazine 92:34, pages 4291-4299.
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Articles from other publishers (2)

Jiann Shieh, Chengyun You, Chiachen Chiu, Jianming Liu & Pingyu Shih. (2016) Black-Silicon on Micropillars with Minimal Surface Area Enlargement to Enhance the Performance of Silicon Solar Cells. Nanoscale Research Letters 11:1.
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A Remolina, B M Monroy, M F García-Sánchez, A Ponce, M Bizarro, J C Alonso, A Ortiz & G Santana. (2009) Polymorphous silicon thin films obtained by plasma-enhanced chemical vapor deposition using dichlorosilane as silicon precursor. Nanotechnology 20:24, pages 245604.
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