Improvement in the setup of the inline sputter system and the ITO sputtering process by measuring and controlling the base vacuum level

Min Hyung Ahn Department of Electronics Engineering, College of IT, Kyungwon University, San 65, Kyuongwon Univ., Bokjeong‐dong, Sujeong‐gu, Seongnam City, Kyunggi‐do, 461–701, Korea

Eou Sik Cho Department of Electronics Engineering, College of IT, Kyungwon University, San 65, Kyuongwon Univ., Bokjeong‐dong, Sujeong‐gu, Seongnam City, Kyunggi‐do, 461–701, Korea

Sang Jik Kwon Department of Electronics Engineering, College of IT, Kyungwon University, San 65, Kyuongwon Univ., Bokjeong‐dong, Sujeong‐gu, Seongnam City, Kyunggi‐do, 461–701, Korea Phone: 82–2–31–750–5319 Fax: 82–2–31–750–5319 E-mail: [email protected]

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Improvement in the setup of the inline sputter system and the ITO sputtering process by measuring and controlling the base vacuum level

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Improvement in the setup of the inline sputter system and the ITO sputtering process by measuring and controlling the base vacuum level

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