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Journal of Dispersion Science and Technology Volume 24, 2003 - Issue 3-4
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Strategies for Optimal Chemical Mechanical Polishing (CMP) Slurry Design

G. Bahar Basim Department of Materials Science and Engineering and Engineering Research Center for Particle Science and Technology, University of Florida, 205 Particle Science and Technology Building, P.O. Box 116135, Gainesville, Florida, 32611‐6135, USA
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Scott C. Brown Department of Materials Science and Engineering and Engineering Research Center for Particle Science and Technology, University of Florida, 205 Particle Science and Technology Building, P.O. Box 116135, Gainesville, Florida, 32611‐6135, USA
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Ivan U. Vakarelski Department of Materials Science and Engineering and Engineering Research Center for Particle Science and Technology, University of Florida, 205 Particle Science and Technology Building, P.O. Box 116135, Gainesville, Florida, 32611‐6135, USA
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Brij M. Moudgil Department of Materials Science and Engineering and Engineering Research Center for Particle Science and Technology, University of Florida, 205 Particle Science and Technology Building, P.O. Box 116135, Gainesville, Florida, 32611‐6135, USACorrespondence[email protected]
Pages 499-515 | Received 07 Feb 2003, Accepted 04 Mar 2003, Published online: 06 Feb 2007

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MadhavanS. Esayanur, SureshB. Yeruva, YakovI. Rabinovich & BrijM. Moudgil. (2005) Interaction force measurements using atomic force microscopy for characterization and control of adhesion, dispersion and lubrication in particulate systems. Journal of Adhesion Science and Technology 19:8, pages 611-626.
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Articles from other publishers (17)

Tao Li, Haoyang Sun, Daiqi Wang, Jintao Huang, Dandan Li, Fan Lei & Dazhi Sun. (2021) High-performance chemical mechanical polishing slurry for aluminum alloy using hybrid abrasives of zirconium phosphate and alumina. Applied Surface Science 537, pages 147859.
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Shenghua Yang, Baoguo Zhang, Chenwei Wang, Wenqian Zhang, Yuling Liu & Baohong Gao. (2018) Studies on Electrochemical Characteristics of SiGe in Application to Chemical Mechanical Polishing. ECS Journal of Solid State Science and Technology 7:5, pages P213-P220.
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Filip Ilie & George Ipate. (2017) Chemical-Mechanical Impact of Nanoparticles and pH Effect of the Slurry on the CMP of the Selective Layer Surfaces. Lubricants 5:2, pages 15.
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Zeynep Ozdemir, Valentin Craciun & Bahar Basim. (2015) Self-protective Oxide Nano-Coatings for Enhanced Surface Biocompatibility of Titanium. MRS Proceedings 1806, pages 7-12.
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Cathy E. McNamee & Ko Higashitani. (2013) Effect of the Charge and Roughness of Surfaces on Normal and Friction Forces Measured in Aqueous Solutions. Langmuir 29:16, pages 5013-5022.
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Ivan U. Vakarelski, Naofumi Teramoto, Cathy E. McNamee, Jeremy O. Marston & Ko Higashitani. (2012) Ionic Enhancement of Silica Surface Nanowear in Electrolyte Solutions. Langmuir 28:46, pages 16072-16079.
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G. Bahar Basim. (2011) Effect of slurry aging on stability and performance of chemical mechanical planarization process. Advanced Powder Technology 22:2, pages 257-265.
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Cecil A. Coutinho & Vinay K. Gupta. 2011. Applied Plastics Engineering Handbook. Applied Plastics Engineering Handbook 519 532 .
Ivan U. Vakarelski, Scott C. Brown, G. Bahar Basim, Yakov I. Rabinovich & Brij M. Moudgil. (2010) Tailoring Silica Nanotribology for CMP Slurry Optimization: Ca 2+ Cation Competition in C 12 TAB Mediated Lubrication . ACS Applied Materials & Interfaces 2:4, pages 1228-1235.
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Cecil A. Coutinho, Subrahmanya R. Mudhivarthi, Ashok Kumar & Vinay K. Gupta. (2008) Novel ceria–polymer microcomposites for chemical mechanical polishing. Applied Surface Science 255:5, pages 3090-3096.
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Bahar Basim, Ivan Vakarelski, Brij Moudgil & Scott Brown. 2008. Dekker Encyclopedia of Nanoscience and Nanotechnology, Second Edition - Six Volume Set (Print Version). Dekker Encyclopedia of Nanoscience and Nanotechnology, Second Edition - Six Volume Set (Print Version) 153 167 .
Elena Taran, Yoichi Kanda, Ivan U. Vakarelski & Ko Higashitani. (2007) Nonlinear friction characteristics between silica surfaces in high pH solution. Journal of Colloid and Interface Science 307:2, pages 425-432.
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Ruslan Burtovyy, Yong Liu, Bogdan Zdyrko, Alex Tregub, Mansour Moinpour, Mark Buehler & Igor Luzinov. (2007) AFM Measurements of Interactions Between CMP Slurry Particles and Substrate. Journal of The Electrochemical Society 154:6, pages H476.
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Elena Taran, Bogdan C. Donose, Ivan U. Vakarelski & Ko Higashitani. (2006) pH dependence of friction forces between silica surfaces in solutions. Journal of Colloid and Interface Science 297:1, pages 199-203.
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Bogdan C. Donose, Ivan U. Vakarelski & Ko Higashitani. (2005) Silica Surfaces Lubrication by Hydrated Cations Adsorption from Electrolyte Solutions. Langmuir 21:5, pages 1834-1839.
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Tae-Gun Kim, Nam-Hoon Kim, Sang-Yong Kim & Eui-Goo Chang. (2004) Optimization of Removal Rates with Guaranteed Dispersion Stability in Copper CMP Slurry. Transactions on Electrical and Electronic Materials 5:6, pages 233-236.
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Ivan U. Vakarelski, Scott C. Brown, Yakov I. Rabinovich & Brij M. Moudgil. (2004) Lateral Force Microscopy Investigation of Surfactant-Mediated Lubrication from Aqueous Solution. Langmuir 20:5, pages 1724-1731.
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