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Ferroelectrics Volume 401, 2010 - Issue 1
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SECTION A: THEORIES, MODELING, DOMAINS, PHASE TRANSITIONS AND CRITICAL PHENOMENA

Study of Ferroelectic Properties in Ferroelectric/High-k Dielectric Bilayers

Z. Ma State Key Laboratory of ASIC & System, Department of Microelectronics, Fudan University, Shanghai, 200433, People's Republic of China
&
A. Q. Jiang State Key Laboratory of ASIC & System, Department of Microelectronics, Fudan University, Shanghai, 200433, People's Republic of China
Pages 129-133 | Received 23 Aug 2009, Accepted 30 Sep 2009, Published online: 01 Dec 2010
 
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Abstract

The Ferroelectricity maintained in ultrathin films could suffer from bad polarization retention due to epitaxial stresses and interfacial effects. It makes a great difference to incorporate ultrathin PZT films with a few nanometer-thick Al2O3. The ferroelectric properties, such as fatigue and retention, show obviously changes in our experiment. The ultra thin Al2O3 layer which acts as a tunnel switch in the progress of domain switching affects ferroelectric properties in many ways.

Acknowledgment

This work was supported by National Natural Science Foundation of China (No. 60776054), Shanghai Key Program (No. 08JC1402100), and the Program for Professor of Special Appointment (Eastern Scholar) at Shanghai.

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