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SECTION G: FERROELECTRIC THIN AND THICK FILMS

Optimization of Pt and PZT Films for Ferroelectric-Gate Thin Film Transistors

, , , , &
Pages 281-291 | Received 23 Aug 2009, Accepted 19 Oct 2009, Published online: 01 Dec 2010
 

Abstract

The polycrystalline Pt film with an excellent (111) orientation and a small grain size of about 30 nm was successfully prepared on a SiO2/Si substrate by the new structured-sputtering system. By optimizing annealing process and using the highly (111)-oriented Pt film as a bottom electrode, an epitaxial-grade (111)-oriented PZT film was successfully prepared by the sol-gel method. Operation of the ferroelectric-gate thin film transistor (FGT) with indium-tin-oxide (ITO) channel, which was based on the optimum Pt and PZT films, has been verified. The FGT device exhibited good properties and performance with high “on/off” current ratio (∼105), adequate memory window (1.2 V) and small swing factor (∼88 mV/decade).

Acknowledgment

This work was partially supported by the Shimoda Nano-Liquid Project, ERATO, Japan Science and Technology Agency.

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