Nickel(II) complexes of N-(dialkylcarbamothioyl)-4-nitrobenzamide as single-source precursors for the deposition of nanostructured nickel sulfide thin films by chemical vapor deposition

Abstract

Nickel(II) complexes of N-(di-alkyl-carbamothioyl)-4-nitrobenzamide (alkyl = ethyl or n-propyl) have been synthesized and characterized by infrared spectroscopy, elemental analysis, nuclear magnetic resonance spectroscopy, and mass spectrometry. The structures of bis[N-(diethylcarbamothioyl)-4-nitrobenzamide]nickel(II) (2a) and bis[N-(dipropylcarbamothioyl)-4-nitrobenzamide]nickel(II) (2b) have been determined by X-ray crystallography. FTIR and NMR of the nickel complexes showed the absence of the N–H proton resonance and the N–H stretch and shift of ν_C=O and ν_C=S as expected. Both complexes have been used as single-source precursors for the deposition of nickel sulfide nanostructured thin films by aerosol-assisted chemical vapor deposition. The nanostructured thin films were characterized by X-ray powder diffraction, scanning electron microscopy, energy dispersive X-ray analysis, and atomic force microscopy.

Keywords:

• Nickel complexes
• Crystal structure
• cis-Configuration
• Thin films
• AACVD
• SEM

Supplementary material

Crystallographic data for the structure reported in this article have been deposited with Cambridge Crystallographic Data Center, CCDC 879,351 (2a) and 879,353 (2b). Copies of this information may be obtained free of charge from the Director, CCDC, 12 Union Road, Cambridge, CBZ IEZ, UK. Facsimile 44 01223 336 033, E-mail: [email protected] or www:http//www.ccdc.com.ac.uk/deposit.

Acknowledgments

S. Saeed would like to acknowledge the HEC, Government of Pakistan for financial support and also would like to thank The University of Manchester for providing the facilities for this work.