Structure and characteristic studies of ZrAlNiCu films prepared by magnetron sputtering

Abstract

This study explores the influence of process parameters on the structural, mechanical, and electrical properties of ZrAlNiCu alloy and nitride film obtained by magnetron sputtering of a single Zr₅₁Al₁₁Ni₄Cu₃₄ target. Selected variables affecting the process are working pressure, substrate temperature, and nitrogen partial pressure. Almost all films are amorphous except for nitride films deposited at moderate nitrogen partial pressure, which consist of the FCC-ZrN nanophase. A low working pressure and high substrate temperature result in refined boundary interfaces, thus increasing their hardness and electrical conductivity. Nitride films have higher hardness and lower electrical conductivity than alloy films because of their strong ionic metal-N bonding. Thus, the formation of FCC-ZrN nanocrystals is conducive to the further improvement of hardness.

KEYWORDS:

• Metallic glass films
• working pressure
• substrate temperature
• nitrogen partial pressure
• mechanical property
• electrical property

Acknowledgements

The National Science and Technology Council of Taiwan funded this study under grant number NSC 109-2221-E-005-035-MY3. The National Cheng Kung University also provides partial support through its Core Facility Center, National Cheng Kung University, Taiwan.

Disclosure statement

No potential conflict of interest was reported by the author(s).

Additional information

Funding

This work was supported by National Science and Technology Council [grant number 109-2811-E-005 -512 -MY3].