Experimental Study of SiO₂ Soot Deposition using the Outside Vapor Deposition Method

Figures & data

FIG. 1 Schematic representation of the OVD method used in this work.

FIG. 2 Influence of the target translation/rotation speed ratio on the target temperature.

TABLE 1 Parameters of deposition for a given configuration, tuning the O₂/H₂ gas flow

							Particle diameter	Specific surface
T (°C)	Δ T (°C)	Passes	η (%)	Δ η (%)	ρ (g.cm^− 3)	Δ ρ (g.cm^− 3)	(nm) (using SEM)	area (m^2.g^–1).
755	5	15	9.90	0.10	0.15	0.01	50–150	73
800	5	15	9.30	0.10	0.18	0.01	50–150	—
835	25	15	11.0	0.10	0.20	0.01	50–150	—
935	5	15	9.3	0.10	0.28	0.01	50–150	—
1050	30	14.5	5.20	0.05	0.35	0.02	100–110	22
1120	10	15	4.80	0.05	0.51	0.02	100–110	—
1165	30	15	4.25	0.05	0.58	0.03	Sintered	—
1275	5	16	4.50	0.05	0.60	0.03	Sintered	12
T is the surface temperature after 10 passes of deposition, Δ M = 1/100 g and Δ Φext = 1/100 mm, Δ ρ/ρ = 5%, Δ η/η = 10%, 1 pass corresponds to a roundtrip of the target (i.e., two deposited layers).

FIG. 3 Influence of the target temperature on the soot properties.

FIG. 4 SEM pictures of the soot layers deposited at various target temperatures.

FIG. 5 Distribution of the silica particle size. The experimental data points extracted from Figure 4 have been adjusted using a Gaussian function.

FIG. 6 Influence of the target temperature on the deposition efficiency (15 deposited layers for each sample).

FIG. 7 Evolution of the target temperature with the number of passes.

FIG. 8 Refractive index profile (Substrate rod corresponds to a commercial silica rod reference Heraeus LWQ100).