Monte Carlo simulation of damascene electroplating: effects of additives

Abstract

The influence of additives on the filling process of via holes in damascene electroplating is investigated with use of a kinetic Monte Carlo method. The basic system is the solid-by-solid model for crystal growth which includes the vacancy formation during the growth of thin film. Three kinds of additives are included in the model to control the local surface growth rate. Inhibitors and levelers have the effect of preventing the deposition, while accelerators increase the local growth rate. Levelers are modeled to stick to the tips of the surface. We performed a series of simulations by changing the parameters which characterize the additives to see their influence on the filling mechanism. It is shown that void-free filling is possible by the combination of the effects of the additives.

Keywords:

• Damascene electroplating
• Void formation
• Additives
• Monte Carlo simulation

Acknowledgements

The authors would like to thank Dr T. Murakami of C. Uyemura & Co., Ltd for useful discussions.