Figures & data
Table 1. Chemical composition (in wt.%) of the wires and base plate.
Table 2. Different combination of Ar and CO2 gases for single layer deposition with solid (SW) and metal-cored (MCW) wires.
Table 3. Parameters used for deposition of single-layer deposits.
Table 4. Welding parameters used for evaluation of silicon islands in the metal cored wire.
Table 5. A Summary of tests performed to compare the standard (MCW) and the modified metal cored wire (MCW-m).
Figure 1. Cross-sectional profiles of single-layer deposits produced using solid wire with different combinations of Ar and CO2 gases.
![Figure 1. Cross-sectional profiles of single-layer deposits produced using solid wire with different combinations of Ar and CO2 gases.](/cms/asset/d6f6ea00-c720-4e59-b785-97725af1e155/twld_a_2337163_f0001_b.jpg)
Figure 2. Cross-sectional profiles of single-layer deposits produced using metal-cored wire with different combinations of Ar and CO2 gases.
![Figure 2. Cross-sectional profiles of single-layer deposits produced using metal-cored wire with different combinations of Ar and CO2 gases.](/cms/asset/47abb33f-d9a9-4339-b215-189383ba1487/twld_a_2337163_f0002_b.jpg)
Figure 3. Silicon islands formation in the deposits produced using standard and modified metal cored wires in the horizontal position. Note the change in location and amount of silicates.
![Figure 3. Silicon islands formation in the deposits produced using standard and modified metal cored wires in the horizontal position. Note the change in location and amount of silicates.](/cms/asset/5a2c8f9b-25da-4d5c-8edd-9698ecf81bd5/twld_a_2337163_f0003_c.jpg)
Table 6. Chemical composition (in wt.%) of the original and modified metal cored wires.
Table 7. Tensile and Charpy results in as-welded and after PWHT for the MCW-m and MCW wires.