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Radiation Effects and Defects in Solids
Incorporating Plasma Science and Plasma Technology
Volume 169, 2014 - Issue 3
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Original Articles

Characterization of Gafchromic EBT3 films for ultraviolet radiation dosimetry

Abdulkadir AydarousDepartment of Physics, Faculty of Science, Taif University, PO Box 888, Taif, Kingdom of Saudi ArabiaCorrespondence[email protected]
,
Enaam Ali Al-OmaryDepartment of Physics, Faculty of Science, Taif University, PO Box 888, Taif, Kingdom of Saudi Arabia
&
Mahmoud El GhazalyDepartment of Physiology, Faculty of Medicine, Taif University, PO Box 888, Taif, Kingdom of Saudi Arabia;Department of Physics, Faculty of Science, Zagazig University, PO Box 44519, Zagazig, Egypt
Pages 249-255 | Received 14 Apr 2013, Accepted 27 Aug 2013, Published online: 24 Oct 2013
 
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Abstract

A newly released processless Gafchromic EBT3 film was investigated for its response to ultraviolet radiation (UVR) at three different wavelengths: 365 (UVA), 302 (UVB) and 254 nm (UVC). The change in the film's optical density was dependent on the radiance exposure and UV wavelength and was found to correlate with the UV intensity. The dynamic range of the EBT3 films is ∼5 to ∼60 J/cm2 for UVA and UVB and ∼5 to ∼300 J/cm2 for UVC. The dose sensitivity of EBT3 films for UVA and UVB radiation was approximately 10 times higher than that for UVC radiation. The results indicate the suitability of EBT3 films for quantitative and qualitative measurements of UVR exposure.

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