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Phosphorus, Sulfur, and Silicon and the Related Elements Volume 180, 2005 - Issue 11
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Original Articles

Chemoselective Deprotection of Thioacetals/Thioketals Using HIO3 in the Presence of Wet SiO2 Under Mild Solvent-Free Conditions

Moslem M. Lakouraj Department of Chemistry, University of Mazandaran, Babolsar, Iran
,
Mahmood Tajbakhsh Department of Chemistry, University of Mazandaran, Babolsar, Iran
,
Farhad Shirini Department of Chemistry, Guilan University, Rasht, Iran
&
Mohammad V. Asady Tamami Department of Chemistry, Guilan University, Rasht, Iran
Pages 2423-2429 | Received 24 Aug 2004, Accepted 26 Oct 2004, Published online: 16 Aug 2006
 
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Abstract

HIO 3 in the presence of wet SiO 2 is highly efficient and a mild reagent for selective deprotection of a variety of thioacetals/thioketals to the corresponding parent carbonyl compounds at room temperature and under solvent-free conditions.

We are thankful to the Mazandaran University Research Council for their partial support of this work.

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