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Integrated Ferroelectrics
An International Journal
Volume 88, 2007 - Issue 1
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SECTION I: MEMS, PYROELECTRIC/IR, OPTOELECTRONIC MATERIALS: THIN-FILM PROCESSING

EFFECTS OF ELECTRODEPOSITION CONDITIONS ON THE MICROSTRUCTURES OF ZNO THIN FILMS

SONGTAO JIANG The State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Microelectronics and Solid State Electronics, University of Electronic Science and Technology of China, 4, section 2, North Jianshe Road, Chengdu, 610054, P. R. China
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MENGQIANG WU The State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Microelectronics and Solid State Electronics, University of Electronic Science and Technology of China, 4, section 2, North Jianshe Road, Chengdu, 610054, P. R. China
,
YING ZHOU The State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Microelectronics and Solid State Electronics, University of Electronic Science and Technology of China, 4, section 2, North Jianshe Road, Chengdu, 610054, P. R. China
,
YUAN WEN The State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Microelectronics and Solid State Electronics, University of Electronic Science and Technology of China, 4, section 2, North Jianshe Road, Chengdu, 610054, P. R. China
,
CHENGTAO YANG The State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Microelectronics and Solid State Electronics, University of Electronic Science and Technology of China, 4, section 2, North Jianshe Road, Chengdu, 610054, P. R. China
&
SHUREN ZHANG The State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Microelectronics and Solid State Electronics, University of Electronic Science and Technology of China, 4, section 2, North Jianshe Road, Chengdu, 610054, P. R. China
Pages 33-43 | Received 31 May 2006, Published online: 12 Oct 2011
 
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ABSTRACT

ZnO thin films were grown by cathodic deposition on indium tin oxide (ITO)-covered glass substrates from a simple aqueous zinc nitrate solution. Cyclic voltammetry (CV) experiments were performed to verify the reaction mechanism. X-ray diffraction measurements indicated that the as-grown films were of hexagonal wurtzite structure. The influence of the electrodeposition conditions and the post-heating on the microstructures of the polycrystalline ZnO thin films was investigated by SEM and AFM observations. The microstructures of the ZnO thin films could be improved by annealing treatment. The films obtained at 0.1 M Zn(NO3), −0.9 V potential and 65°C were compact, homogeneous and (002) oriented, and the average deposition rate can be evaluated to be 2 μm/h.

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