LabView based virtual calorimetric etching solution analyzer (CESA) for the online quantification of hydrogen peroxide for the semiconductor industry

Abstract

A virtual instrument, calorimetric etching solution analyzer based on LabVIEW 2010 platform was developed, characterized and validated for the on-line automated H₂O₂ concentration monitoring in SC-1 etching solution applied in the semiconductor industry. The virtual instrument completely controls all analyzer functions including sampling, analytical response measurement, digital data processing and H₂O₂ concentration calculation as well as the instrument calibration and real time concentration correction by fresh solution addition to the etching machine. The hardware, the software, the user interface and the instrument functioning are presented and discussed with the analytical characterization and validation by industrial sample analysis in comparison with a standard permanganate method.

Keywords:

• Calorimetry
• hydrogen peroxide
• semiconductor etching
• virtual instrumentation

Disclosure statement

There are no conflicts of interest to declare.

Data availability statement

The data that support the findings of this study are available from the corresponding author.