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Focus on Photovoltaic Science, Applications and Technology

One-step growth of thin film SnS with large grains using MOCVD

ORCID Icon, , , &
Pages 153-159 | Received 15 Sep 2017, Accepted 12 Jan 2018, Published online: 15 Feb 2018

Figures & data

Figure 1. SEM images of film deposited using optimised growth parameters at different growth temperatures: (a) 432 °C; (b) 472 °C.

Figure 1. SEM images of film deposited using optimised growth parameters at different growth temperatures: (a) 432 °C; (b) 472 °C.

Figure 2. Sn-S phase diagram taken from Ref. [Citation17].

Notes: Reprinted from R.E. Banai, M.W. Horn and J.R.S. Brownson, A review of tin (II) monosulfide and its potential as a photovoltaic absorber, Sol. Energy Mater. Sol. Cells 150 (2016) 112–129, with permission from Elsevier.
Figure 2. Sn-S phase diagram taken from Ref. [Citation17].

Table 1. Atomic weight (at. %) composition determined by EDX for films deposited using different S/Sn precursor partial pressure ratios, [S/Sn]i.

Figure 3. Absorption spectra of films deposited at different [S/Sn]i at a growth temperature of 470 °C.

Figure 3. Absorption spectra of films deposited at different [S/Sn]i at a growth temperature of 470 °C.

Figure 4. Band gap calculation of films deposited at different [S/Sn]i using absorption coefficient × energy squared versus energy, (αE)2 vs. E, for direct (Egd) transitions and the square route of absorption coefficient × energy versus energy, (αE)1/2 vs. E, for indirect (Egi) transitions (inset).

Figure 4. Band gap calculation of films deposited at different [S/Sn]i using absorption coefficient × energy squared versus energy, (αE)2 vs. E, for direct (Egd) transitions and the square route of absorption coefficient × energy versus energy, (αE)1/2 vs. E, for indirect (Egi) transitions (inset).

Figure 5. XRD of films deposited at 470 °C using different [S/Sn]i equal to 5.4, 6.2 and 8.0, which showed cross-over of SnS 1:1 stoichiometry determined from EDX measurements.

Note: A film deposited at 432 °C and [S/Sn]i equal to 6.2 is included for comparison.
Figure 5. XRD of films deposited at 470 °C using different [S/Sn]i equal to 5.4, 6.2 and 8.0, which showed cross-over of SnS 1:1 stoichiometry determined from EDX measurements.

Figure 6. Raman spectroscopy of different film regions for SnS samples deposited at optimised growth parameters on (a) ITO mapped at a 304 cm−1 frequency and (b) Mo mapped at a 193 cm−1 frequency.

Figure 6. Raman spectroscopy of different film regions for SnS samples deposited at optimised growth parameters on (a) ITO mapped at a 304 cm−1 frequency and (b) Mo mapped at a 193 cm−1 frequency.