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Research Article

In-situ analysis of continuous cooling precipitation in Al alloys by wide-angle X-ray scattering

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Pages 205-218 | Received 04 Nov 2019, Accepted 04 Mar 2020, Published online: 02 Apr 2020

Figures & data

Figure 1. Experimental setup showing the beam schematic and the modified quenching dilatometer with an entrance/exit window

Figure 1. Experimental setup showing the beam schematic and the modified quenching dilatometer with an entrance/exit window

Table 1. Mass fractions of alloying elements in the investigated aluminium wrought alloys

Figure 2. Schematic presentation of the time-temperature-profiles for the experiments

Figure 2. Schematic presentation of the time-temperature-profiles for the experiments

Figure 3. (a) diffraction pattern after cooling EN AW-7150 to room temperature at 0.3 K/s, as recorded by the imaging plate detector, (b) diffraction-data converted into a diffractogram at room temperature after cooling EN AW-7150 at 0.3 K/s

Figure 3. (a) diffraction pattern after cooling EN AW-7150 to room temperature at 0.3 K/s, as recorded by the imaging plate detector, (b) diffraction-data converted into a diffractogram at room temperature after cooling EN AW-7150 at 0.3 K/s

Table 2. Characteristic d-spacing, lattice parameters hkl and calculated 2-Theta angles specific to the applied wave-length (λ = 0.012958 nm) with associated intensities for the structures of α-Al (fcc, a = 0.405 nm, η-MgZn2 (hexagonal, a = 0.521 nm, c = 0.860 nm)and S-Al2CuMg (orthorhombic, a = 0.400 nm, b = 0.923 nm, c = 0.714 nm)

Table 3. Characteristic d-spacing, lattice parameters hkl and calculated 2-Theta angles specific to the applied wave-length (λ = 0.012958 nm) with associated intensities for the structure of β-Mg2Si (fcc, a = 0.639 nm)

Figure 4. Dynamic evolution of diffraction pattern during the cooling of EN AW-7150 at 0.3 K/s to room temperature after solution annealing at 480°C

Figure 4. Dynamic evolution of diffraction pattern during the cooling of EN AW-7150 at 0.3 K/s to room temperature after solution annealing at 480°C

Figure 5. Detailed view of the diffraction pattern during the cooling of EN AW-7150 at 0.3 K/s at different temperatures showing the shift of high-intensity peaks

Figure 5. Detailed view of the diffraction pattern during the cooling of EN AW-7150 at 0.3 K/s at different temperatures showing the shift of high-intensity peaks

Figure 6. Detailed view of specific diffraction peaks for η-MgZn2 (1.73°), S-Al2CuMg (2.27°) (EN AW-7150 in a) and β-Mg2Si (2.02°) (EN AW-6082 in b) during cooling of a) EN AW-7150 at 0.3 K/s and b) EN°AW-6082 at 0.03 K/s. The background noise, which depends on 2-Theta angle and temperature can be seen

Figure 6. Detailed view of specific diffraction peaks for η-MgZn2 (1.73°), S-Al2CuMg (2.27°) (EN AW-7150 in a) and β-Mg2Si (2.02°) (EN AW-6082 in b) during cooling of a) EN AW-7150 at 0.3 K/s and b) EN°AW-6082 at 0.03 K/s. The background noise, which depends on 2-Theta angle and temperature can be seen

Figure 7. (a) detected diffraction counts for the 002 distance of the η-MgZn2 structure formation in EN AW-7150 during cooling at 0.3 K/s for selected temperatures; (b) normalised signal step specific baselines used for peak area integration

Figure 7. (a) detected diffraction counts for the 002 distance of the η-MgZn2 structure formation in EN AW-7150 during cooling at 0.3 K/s for selected temperatures; (b) normalised signal step specific baselines used for peak area integration

Figure 8. Dynamic evolution of normalised WAXS peaks for EN AW-7150 during cooling at 0.3 K/s after solution treatment for (a) the η-MgZn2 structure (002, 1.73°), (b) the S-Al2CuMg phase structure (111, 2.27°) and (c) the β-Mg2Si structure (111, 2.02°) during cooling of EN AW-6082 at 0.03 K/s

Figure 8. Dynamic evolution of normalised WAXS peaks for EN AW-7150 during cooling at 0.3 K/s after solution treatment for (a) the η-MgZn2 structure (002, 1.73°), (b) the S-Al2CuMg phase structure (111, 2.27°) and (c) the β-Mg2Si structure (111, 2.02°) during cooling of EN AW-6082 at 0.03 K/s

Figure 9. (a), (b), (c) integrated peak areas of η-MgZn2, S-Al2CuMg and β-Mg2Si; (d), (e), (f) differentiation of the smoothed integral curve to the process variable ‘transformation rate’

Figure 9. (a), (b), (c) integrated peak areas of η-MgZn2, S-Al2CuMg and β-Mg2Si; (d), (e), (f) differentiation of the smoothed integral curve to the process variable ‘transformation rate’

Figure 10. DSC cooling curves of EN AW-7150 after solution treatment indicating a minimum of three precipitation reactions; DSC data adapted from [Citation8]

Figure 10. DSC cooling curves of EN AW-7150 after solution treatment indicating a minimum of three precipitation reactions; DSC data adapted from [Citation8]

Figure 11. Comparison of obtained WAXS results to DSC curves [Citation8] during cooling of EN AW-7150 after solution treatment

Figure 11. Comparison of obtained WAXS results to DSC curves [Citation8] during cooling of EN AW-7150 after solution treatment

Figure 12. DSC cooling curves for EN AW-6082 after solution treatment, indicating a minimum of two precipitation reactions; DSC data adapted from [Citation10]

Figure 12. DSC cooling curves for EN AW-6082 after solution treatment, indicating a minimum of two precipitation reactions; DSC data adapted from [Citation10]

Figure 13. Comparison of WAXS results to DSC curves [Citation10] during the cooling of EN AW-6082 after solution treatment

Figure 13. Comparison of WAXS results to DSC curves [Citation10] during the cooling of EN AW-6082 after solution treatment

Figure 14. Improved continuous cooling precipitation diagram of EN AW-6082 after 560°C for 20 min, indicating the temperature ranges of overlapping precipitation reactions

Figure 14. Improved continuous cooling precipitation diagram of EN AW-6082 after 560°C for 20 min, indicating the temperature ranges of overlapping precipitation reactions