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Philosophical Magazine Volume 87, 2007 - Issue 6
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Original Articles

On the structure and composition of nanoscale TiAlN/VN multilayers

Z. Zhou Department of Engineering Materials, University of Sheffield, Sheffield S1 3JD, UK
,
W. M. Rainforth Department of Engineering Materials, University of Sheffield, Sheffield S1 3JD, UKCorrespondence[email protected]
,
U. Falke SuperSTEM, Daresbury Laboratory, Daresbury, Cheshire WA4 4AD, UK
,
M. Falke SuperSTEM, Daresbury Laboratory, Daresbury, Cheshire WA4 4AD, UK
,
A. Bleloch SuperSTEM, Daresbury Laboratory, Daresbury, Cheshire WA4 4AD, UK
&
P. E. Hovsepian Materials and Engineering Research Institute, Sheffield Hallam University, Sheffield S1 1WB, UK
Pages 967-978 | Received 17 Sep 2004, Accepted 07 Apr 2005, Published online: 11 Jan 2007
 
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Abstract

The chemical and physical structure of a TiAlN/VN multilayer, of average layer thickness 3.4 ± 0.4 nm, was characterized using a spherical aberration-corrected STEM, utilizing a nominal 0.1-nm beam, by HAADF and EELS. The interface between layers was shown to be rough, with local thickness variations evident in layer thickness. Chemical mixing between layers was identified, consistent with numerical modelling of the deposition flux and layer growth. The implications of the compositional modulation are discussed.

Acknowledgement

Financial support from Engineering and Physical Science Research Council (EPSRC), UK, Grant No. GR/N23998/01 is acknowledged.

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