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Molecular Crystals and Liquid Crystals Volume 445, 2006 - Issue 1
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Original Articles

Vacuum Spray Method for Semiconductor Polymer Thin Film Preparation

Xiaoliang Mo Photonic Device Application Group, Photonics Research Institute, National Institute of Advanced Industrial Science and Technology, Ikeda, Osaka, JapanCorrespondence[email protected]
,
Toshiko Mizokuro Photonic Device Application Group, Photonics Research Institute, National Institute of Advanced Industrial Science and Technology, Ikeda, Osaka, Japan
,
Hiroyuki Mochizuki Photonic Device Application Group, Photonics Research Institute, National Institute of Advanced Industrial Science and Technology, Ikeda, Osaka, Japan
,
Nobutaka Tanigaki Photonic Device Application Group, Photonics Research Institute, National Institute of Advanced Industrial Science and Technology, Ikeda, Osaka, Japan
&
Takashi Hiraga Photonic Device Application Group, Photonics Research Institute, National Institute of Advanced Industrial Science and Technology, Ikeda, Osaka, Japan
Pages 27/[317]-33/[323] | Published online: 23 Aug 2006
 
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ABSTRACT

Semiconductor polymers poly(3-dodecylthiophene-2,5-diyl), regioregular (PDDT) and poly[2,5-bis(octyloxy)-1,4-phenylenevinylene] (BO-PPV) are prepared by thin films by a spray method under vacuum. The formation process and properties of these polymer thin films are described. The dilute solution was used to prepare thin film by this method; annealing the semiconductor polymer thin film under vacuum would highly increase their surface smoothness.

Acknowledgments

This work was supported in part by the Ministry of Education, Culture, Sports, Science and Technology (MEXT) of Japan under a grant of the support of young researchers, and by Grants-in-aid for the Japan Society for the Promotion of Science (JSPS) fellows.

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