Photosensitive Paste Formulation and Photolithographic Process for the Fabrication of Barrier Ribs in PDP: Effect of Surface-Treated Fumed Silica

Abstract

In this work, formulation of photosensitive pastes was investigated to fabricate barrier ribs of PDP by a photolithographic process. Optimum paste compositions could be achieved by the formulation of alkali-developable polymeric binders, functional monomers, a photoinitiator, and a solvent with barrier rib powders of which surface was treated with fumed silica particles. It was applied to the paste and was found that photolithographic patterns of barrier ribs could be obtained with good resolution up to 110 ∼ 120 μm of height and 60 ∼ 80 μm of width after sintering. This could be explained by increased light transmittance efficiency through UV light guide channel formed with an aid of nano-sized fumed silica used for surface treatment of barrier rib powders.

Keywords:

• barrier rib
• fumed silica
• photolithographic process
• photosensitive paste
• plasma display panel

Notes

O: Good, Δ: fair, X: bad.