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Original Articles

Estimation of thermal resistance distributions for die-attach testing in microelectronics

, &
Pages 715-742 | Received 16 Dec 2005, Accepted 11 Jul 2006, Published online: 28 Sep 2007

Figures & data

Figure 1. Semiconductor chip attached to a heat spreader.

Figure 1. Semiconductor chip attached to a heat spreader.

Figure 2. Thermal boundary conditions considered for the block 1 in multiblock decomposition (cross-sectional view).

Figure 2. Thermal boundary conditions considered for the block 1 in multiblock decomposition (cross-sectional view).

Figure 3. Thermal boundary conditions considered for the block 2 in multi-block decomposition (cross-sectional view).

Figure 3. Thermal boundary conditions considered for the block 2 in multi-block decomposition (cross-sectional view).

Figure 4. Principle of the iterative process for solving the 3D steady-state heat conduction direct problem.

Figure 4. Principle of the iterative process for solving the 3D steady-state heat conduction direct problem.

Figure 5. Heat source configuration on the upper face of the block 1 for the validation of the direct problem.

Figure 5. Heat source configuration on the upper face of the block 1 for the validation of the direct problem.

Figure 6. Interface thermal resistance distribution (K m2 W−1): Rint(x1,y1) = 0.5 × sin(x1.y1) − validation of the direct problem.

Figure 6. Interface thermal resistance distribution (K m2 W−1): Rint(x1,y1) = 0.5 × sin(x1.y1) − validation of the direct problem.

Table 1. Thermal properties and dimensions of the microelectronic device for the validation of the direct problem

Figure 7. Validation of the direct problem–temperature profiles on the upper face of the block 1: (a) for y1 = 7.5 mm, (b) for x1 = 7.5 mm.

Figure 7. Validation of the direct problem–temperature profiles on the upper face of the block 1: (a) for y1 = 7.5 mm, (b) for x1 = 7.5 mm.

Figure 8. Examples of parametrization of the interface thermal resistance distribution: (a) 4-zone partition, (b) 25-zone partition, (c) 64-zone partition.

Figure 8. Examples of parametrization of the interface thermal resistance distribution: (a) 4-zone partition, (b) 25-zone partition, (c) 64-zone partition.

Figure 9. Exact interface thermal resistance distributions (Km2 W−1) investigated in the numerical experiments.

Figure 9. Exact interface thermal resistance distributions (Km2 W−1) investigated in the numerical experiments.

Table 2. Spatial characteristics of the exact interface thermal resistance distributions

Figure 10. Heat source configurations on the upper face of the block 1 investigated in the numerical experiments.

Figure 10. Heat source configurations on the upper face of the block 1 investigated in the numerical experiments.

Figure 11. Sensitivity coefficients distribution (Wm−2) of η(β) to the component n°33 of β computed for the HSC (1) and .

Figure 11. Sensitivity coefficients distribution (Wm−2) of η(β) to the component n°33 of β computed for the HSC (1) and .

Figure 12. Average sensitivity coefficients profiles computed for the three HSC and .

Figure 12. Average sensitivity coefficients profiles computed for the three HSC and .

Figure 13. Evolution of the estimated distributions (Km2 W−1) (interface (a), HSC (1), and σ = 0): (a) 5 iterations, (b) 20 iterations, (c) 50 iterations, (d) 100 iterations.

Figure 13. Evolution of the estimated distributions (Km2 W−1) (interface (a), HSC (1), and σ = 0): (a) 5 iterations, (b) 20 iterations, (c) 50 iterations, (d) 100 iterations.

Figure 14. Evolution of the functional J for the estimation of the interface (a) with the three HSC, and σ = 0.1 K.

Figure 14. Evolution of the functional J for the estimation of the interface (a) with the three HSC, and σ = 0.1 K.

Figure 15. Evolution of the functional J for the estimation of the interface (b) with the three HSC, and σ = 0.1 K.

Figure 15. Evolution of the functional J for the estimation of the interface (b) with the three HSC, and σ = 0.1 K.

Figure 16. Components of β for the estimation of the interface (a) with the HSC (3) and σ = 0.1 K.

Figure 16. Components of β for the estimation of the interface (a) with the HSC (3) and σ = 0.1 K.

Figure 17. Components of β for the estimation of the interface (b) with the HSC (3) and σ = 0.1 K.

Figure 17. Components of β for the estimation of the interface (b) with the HSC (3) and σ = 0.1 K.

Figure 18. Relative error due to measurement errors for the estimation of the interface (a) with the HSC (3) and σ = 0.1 K.

Figure 18. Relative error due to measurement errors for the estimation of the interface (a) with the HSC (3) and σ = 0.1 K.

Figure 19. Relative error due to measurement errors for the estimation of the interface (b) with the HSC (3) and σ = 0.1 K.

Figure 19. Relative error due to measurement errors for the estimation of the interface (b) with the HSC (3) and σ = 0.1 K.

Figure 20. Evolution of the functional J for the estimation of the interface (a) with the HSC (1), σ = 0.1 K, and different update parameters K.

Figure 20. Evolution of the functional J for the estimation of the interface (a) with the HSC (1), σ = 0.1 K, and different update parameters K.

Figure 21. Computation time of the estimation of the interface (a) with the HSC (1), σ = 0.1 K, as a function of the update parameter K.

Figure 21. Computation time of the estimation of the interface (a) with the HSC (1), σ = 0.1 K, as a function of the update parameter K.

Figure 22. Refinement levels of the interface grid.

Figure 22. Refinement levels of the interface grid.

Figure 23. Interface thermal resistance distribution (K m2 W−1) searched to illustrate the refinement method.

Figure 23. Interface thermal resistance distribution (K m2 W−1) searched to illustrate the refinement method.

Figure 24. Estimated distributions (K m2 W−1) for the first six refinement levels with the HSC (1), σ = 0.1 K and .

Figure 24. Estimated distributions (K m2 W−1) for the first six refinement levels with the HSC (1), σ = 0.1 K and .

Figure 25. Evolution of the functional J for the first six refinement levels with the HSC (1), σ = 0.1 K and .

Figure 25. Evolution of the functional J for the first six refinement levels with the HSC (1), σ = 0.1 K and .

Figure 26. Evolution of the functional J without refinement of the interface grid with the HSC (1), σ = 0.1 K and .

Figure 26. Evolution of the functional J without refinement of the interface grid with the HSC (1), σ = 0.1 K and .

Figure 27. Evolution of the functional J for the first five refinement levels with the HSC (1), σ = 0.1 K and .

Figure 27. Evolution of the functional J for the first five refinement levels with the HSC (1), σ = 0.1 K and .

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