Preparation and tribological characteristics of sulfonated self-assembled monolayer of 3-mercaptopropyl trimethoxysilane TiO₂ films

Figures & data

Figure 1. Atomic force microscope images of (a) the hydroxide substrate (b) MPTS-SAM (c) and oxidised MPTS-SAM, and (d) TiO₂ thin films.

Figure 2. Contact angle of hydroxide substrate and different SAMs.

Figure 3. Variation of adhesive forces of silicon substrate and TiO₂ thin film under various humidity conditions.

Figure 4. Variation of friction forces of silicon substrate and TiO₂ thin films under various humidity conditions (Load: 10 nN, Scanning speed: 10 Hz).

Figure 5. Variation of adhesive forces of silicon substrate and TiO₂ thin film with scanning speed (RH: 35%).

Figure 6. Variation of friction forces of silicon substrate and TiO₂ thin film with scanning speed (Load: 10 nN, RH: 35%).

Figure 7. Variation of adhesive forces of silicon substrate and TiO₂ thin film with loads (RH: 35%).

Figure 8. Variation of friction forces of silicon substrate and TiO₂ thin film with loads (Scanning speed: 10 Hz, RH: 35%).