Figures & data
![](/cms/asset/ee9eb5ea-815f-42cb-839b-387415b7e813/tsnm_a_2133187_uf0001_c.jpg)
Figure 1. Strategy for realization of a large driving force in an IPMC actuator when approaching the performance of muscle.
![Figure 1. Strategy for realization of a large driving force in an IPMC actuator when approaching the performance of muscle.](/cms/asset/492ca6b9-1d12-49c0-803a-7575110bf5d9/tsnm_a_2133187_f0001_c.jpg)
Figure 6. Illustration of (a) the IPMC performance test platform and (b) the test point when bending occurs.
![Figure 6. Illustration of (a) the IPMC performance test platform and (b) the test point when bending occurs.](/cms/asset/f7568786-20d7-4266-b0c2-e380e1fbbc3e/tsnm_a_2133187_f0006_c.jpg)
Figure 7. Cross-sectional scanning electron microscope (SEM) images of Nafion membranes with and without the doped CCNT particles. (a) 0% CCNT-Nafion. (b) 0.5% CCNT-Nafion. (c) 1% CCNT-Nafion. (d) 3% CCNT-Nafion. (e) 5% CCNT-Nafion.
![Figure 7. Cross-sectional scanning electron microscope (SEM) images of Nafion membranes with and without the doped CCNT particles. (a) 0% CCNT-Nafion. (b) 0.5% CCNT-Nafion. (c) 1% CCNT-Nafion. (d) 3% CCNT-Nafion. (e) 5% CCNT-Nafion.](/cms/asset/42f5c5e1-cd2a-4832-b43a-9b1657479792/tsnm_a_2133187_f0007_c.jpg)
Figure 8. (a) Bending angles under 3 VDC application, and (b) blocking forces under 3 and 4 VDC application for IPMCs with various CCNT doping contents at a point located 20 mm away from the clamp.
![Figure 8. (a) Bending angles under 3 VDC application, and (b) blocking forces under 3 and 4 VDC application for IPMCs with various CCNT doping contents at a point located 20 mm away from the clamp.](/cms/asset/4bb34c62-b873-4d95-8cda-13f7909dda2d/tsnm_a_2133187_f0008_c.jpg)
Figure 9. Displacements of IPMCs with various CCNT doping contents at a point located 20 mm away from the clamp under application of a square waveform voltage (3 V, 0.1 Hz).
![Figure 9. Displacements of IPMCs with various CCNT doping contents at a point located 20 mm away from the clamp under application of a square waveform voltage (3 V, 0.1 Hz).](/cms/asset/aaf670fd-94cc-445f-9f6a-712190751891/tsnm_a_2133187_f0009_c.jpg)
Table 1. Electromechanical properties of IPMCs with various CCNT doping contents.
Table 2. Experimental design of isopropyl alcohol-assisted reduction plating.
Figure 10. (a) Displacement under application of 3 VDC and (b) blocking force under application of 3 and 4 VDC of isopropyl alcohol-assisted plating IPMCs at a point located 20 mm away from the clamp.
![Figure 10. (a) Displacement under application of 3 VDC and (b) blocking force under application of 3 and 4 VDC of isopropyl alcohol-assisted plating IPMCs at a point located 20 mm away from the clamp.](/cms/asset/f9a3d75a-7e61-4d74-9ffd-57f5cf141de8/tsnm_a_2133187_f0010_c.jpg)
Figure 11. Displacement of isopropyl alcohol-assisted plating IPMCs at a point located 20 mm away from the clamp under application of a square waveform voltage (3 V, 0.1 Hz).
![Figure 11. Displacement of isopropyl alcohol-assisted plating IPMCs at a point located 20 mm away from the clamp under application of a square waveform voltage (3 V, 0.1 Hz).](/cms/asset/d2efad21-3223-4c95-b4be-726a2edc9337/tsnm_a_2133187_f0011_c.jpg)
Figure 12. SEM images acquired at the electrode-polymer interface of the IPMCs without and with isopropyl alcohol-assisted plating.
![Figure 12. SEM images acquired at the electrode-polymer interface of the IPMCs without and with isopropyl alcohol-assisted plating.](/cms/asset/de5f885c-d8ef-4088-a8d2-68ffa9962d43/tsnm_a_2133187_f0012_c.jpg)
Table 3. Electromechanical properties of isopropyl alcohol-assisted plating IPMCs.
Figure 14. (a) Bending angles and (b) blocking forces under application of 3 VDC for various hot pressed IPMCs at a point located 20 mm away from the clamp.
![Figure 14. (a) Bending angles and (b) blocking forces under application of 3 VDC for various hot pressed IPMCs at a point located 20 mm away from the clamp.](/cms/asset/94e0bef6-4e0a-4103-b21f-b8b06e3b747b/tsnm_a_2133187_f0014_c.jpg)
Figure 15. Displacement of various hot pressed IPMCs at a point located 20 mm away from the clamp under application of a square waveform voltage (3 V, 0.1 Hz).
![Figure 15. Displacement of various hot pressed IPMCs at a point located 20 mm away from the clamp under application of a square waveform voltage (3 V, 0.1 Hz).](/cms/asset/00d117a5-9bf9-48dd-8bf0-c4d4cf61c727/tsnm_a_2133187_f0015_c.jpg)
Table 4. Electromechanical properties of the hot-pressed IPMCs.
Table 5. Integration design of fabrication process with multiple optimized factors.
Figure 16. (a) Bending angles and (b) blocking forces under application of 3 VDC, and (c) displacement under application of a square waveform voltage (3 V, 0.1 Hz) for various hot-pressed IPMCs at a point located 20 mm away from the clamp.
![Figure 16. (a) Bending angles and (b) blocking forces under application of 3 VDC, and (c) displacement under application of a square waveform voltage (3 V, 0.1 Hz) for various hot-pressed IPMCs at a point located 20 mm away from the clamp.](/cms/asset/c9c6dcd4-5c11-486f-a899-d018a124ba65/tsnm_a_2133187_f0016_c.jpg)
Table 6. Performance comparison of various IPMCs (35 mm × 5 mm, measured at L = 20 mm).