Figures & data
Figure 2. Change of the incubation time for the occurrence of flash with a change of temperature and electric field
![Figure 2. Change of the incubation time for the occurrence of flash with a change of temperature and electric field](/cms/asset/e47a3004-0a29-4826-a926-6e2fd8031257/tace_a_1864899_f0002_oc.jpg)
Figure 3. Electric current density and temperature rise of the sample during flashing under the various electric field
![Figure 3. Electric current density and temperature rise of the sample during flashing under the various electric field](/cms/asset/83c8681d-f41c-4e49-bbee-b26bef2dc5ec/tace_a_1864899_f0003_oc.jpg)
Figure 5. X-ray diffractometry pattern of the samples produced by flash sintering in the condition of (a) 1192 °C 0 V/cm, (b) 1192 °C 600 V/cm, (c) 1142 °C 800 V/cm, (d) 1093 °C 1000 V/cm, (e) 1042 °C 1200 V/cm, and of (f) hydroxyapatite powders, and (g) JCPDS file (9-432) of hydroxyapatite
![Figure 5. X-ray diffractometry pattern of the samples produced by flash sintering in the condition of (a) 1192 °C 0 V/cm, (b) 1192 °C 600 V/cm, (c) 1142 °C 800 V/cm, (d) 1093 °C 1000 V/cm, (e) 1042 °C 1200 V/cm, and of (f) hydroxyapatite powders, and (g) JCPDS file (9-432) of hydroxyapatite](/cms/asset/1504f83b-b3c9-4cbd-bc4a-e2d441bea73f/tace_a_1864899_f0005_oc.jpg)
Figure 6. SEM image of the cross-sectional microstructure of the samples prepared by (a) flash sintering at 1051 °C 1000 V/cm for 10 seconds, and (b) normal sintering at 1192°C for one hour
![Figure 6. SEM image of the cross-sectional microstructure of the samples prepared by (a) flash sintering at 1051 °C 1000 V/cm for 10 seconds, and (b) normal sintering at 1192°C for one hour](/cms/asset/cd668979-6565-4f2d-8008-9c0c78d0cbb4/tace_a_1864899_f0006_b.gif)
Figure 7. Transmission electron microscope image of hydroxyapatite sample prepared by flash sintering
![Figure 7. Transmission electron microscope image of hydroxyapatite sample prepared by flash sintering](/cms/asset/12865418-01d8-4744-892e-62b8681b2367/tace_a_1864899_f0007_b.gif)
Figure 8. A sample with partial melting during flash sintering, (a) Front and back surface images of the flash sintered sample under the condition of 1000 V/cm, One can see band-like melt trace between the two electrode holes. (b) A cross-sectional microstructure under the melt trace (c) low magnification(x50) image of the melt trace. One can see splash
![Figure 8. A sample with partial melting during flash sintering, (a) Front and back surface images of the flash sintered sample under the condition of 1000 V/cm, One can see band-like melt trace between the two electrode holes. (b) A cross-sectional microstructure under the melt trace (c) low magnification(x50) image of the melt trace. One can see splash](/cms/asset/a0bd1991-5508-4c77-861e-462b0e486e77/tace_a_1864899_f0008_oc.jpg)