The effect of polishing protocol on surface gloss of different restorative resin composites

Figures & data

Table 1. The investigated materials and their composition.

Material (shade)	Manufacturer	Matrix composition	Inorganic filler content
ACTIVA-Restorative (A2)	Pulpdent Corp, Watertown, USA	Blend of diurethane and other methacrylates with modified polyacrylic acid	55.4 wt% Silica, bioactive glass and sodium fluoride fillers (Ø NR)
G-aenial Anterior (A3)	GC Corp, Tokyo, Japan	UDMA, dimethacrylate co-monomers	76 wt% Pre-polymerized filler (Ø 16–17 µm), silica and strontium fluoride containing fillers (Ø > 100 nm)
everX Flow (Dentin shade)	GC Corp, Tokyo, Japan	Bis-EMA, TEGDMA, UDMA	70 wt% Short glass fiber (Ø 6 µm & barium glass fillers Ø 700 nm)
Filtek Bulk Fill (A2)	3M/ESPE, St. Paul, MN, USA	AUDMA, UDMA, DDDMA	76.5 wt% Zirconia/silica and ytterbium trifluoride fillers in nanometer scale (av. Ø 20 nm)
Alert (A3)	Jeneric/Pentron, Wallingford, CT, USA	Bis-GMA, UDMA, TEGDMA, THFMA	84 wt% Silica (Ø 800 nm) and micrometer scale glass fiber (Ø 7 µm)
G-aenial Flo X (A3)	GC Corp, Tokyo, Japan	UDMA, dimethacrylate co-monomers	69 wt% Barium glass fillers in nanometer scale (av. Ø 700 nm)
BEAUTIFIL-II (A3)	Shofu Inc., Kyoto, Japan	Bis-GMA, UDMA, Bis-MPEPP, TEGDMA.	83.3 wt% Fluoro-silicate glass (av. Ø 800 nm)

Bis-GMA: bisphenol-A-glycidyl dimethacrylate; TEGDMA: triethylene glycol dimethacrylate; UDMA: urethane dimethacrylate; AUDMA: aromatic urethane dimethacrylate; DDDMA: 12-dodecanediol dimethacrylate; Bis-EMA: ethoxylated bisphenol-A-dimethacrylate; Bis-MPEPP: bisphenol A polyethoxy methacrylate; THFMA: tetrahydrofurfuryl-2-methacrylate; wt%: weight percentage; NR: not reported.

Figure 1. Surface Gloss (GU) mean values of specimens in relation to different polishing protocols. Vertical lines represents standard deviation.

Figure 2. Typical 3 D surface profile of specimens in relation to different polishing protocols. A: 4000; B: 2000 grit; C: 1200 grit; D: Sof-Lex spirals; E: Abrasive points. Arrows indicate small pit defects.

Figure 3. SEM photomicrographs of polished surface (4000 grit) of investigated materials. (A) Activa; (B) G-aenial Ant; (C) everX Flow; (D) Filtek BF; (E) Alert; (F) Flo X; (G) BEAUTIFIL-II.