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Transactions of the IMF
The International Journal of Surface Engineering and Coatings
Volume 91, 2013 - Issue 1
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Original Article

Origin of streaks on anodised aluminium alloy extrusions

, , , , &
Pages 11-16 | Received 11 Jun 2012, Accepted 12 Oct 2012, Published online: 12 Nov 2013

Figures & data

Figure 1. Optical image of extrusion with streak defects

Figure 1. Optical image of extrusion with streak defects

Figure 2. Total reflectance of streak (top) and bulk (bottom) regions

Figure 2. Total reflectance of streak (top) and bulk (bottom) regions

Figure 3. Optical micrographs of anodic film: polarised light was used to enhance grain orientation effect

Figure 3. Optical micrographs of anodic film: polarised light was used to enhance grain orientation effect

Figure 4. Backscattered electron micrographs of anodic film: insets show typical grain boundary grooves at increased magnifications

Figure 4. Backscattered electron micrographs of anodic film: insets show typical grain boundary grooves at increased magnifications

Figure 5. Backscattered electron micrographs of cross-section of anodic film attached to alloy substrate

Figure 5. Backscattered electron micrographs of cross-section of anodic film attached to alloy substrate

Figure 6. Map (EBSD) of alloy substrate after film stripping

Figure 6. Map (EBSD) of alloy substrate after film stripping

Figure 7. Optical images of alloy after a reetching and b reanodising

Figure 7. Optical images of alloy after a reetching and b reanodising

Figure 8. Optical micrographs of alloy substrate after film stripping and alkaline etching

Figure 8. Optical micrographs of alloy substrate after film stripping and alkaline etching

Figure 9. Interferometry topography of alkaline etched specimen

Figure 9. Interferometry topography of alkaline etched specimen

Figure 10. Images (SEM) of alloy substrate: a, b streak and c, d bulk regions. a, c are secondary electron images and b, d are corresponding backscattered electron images

Figure 10. Images (SEM) of alloy substrate: a, b streak and c, d bulk regions. a, c are secondary electron images and b, d are corresponding backscattered electron images

Figure 11. Map (EBSD) of as etched sample in streak/bulk interface region. Framed area A represents typical streak region and framed area B represents typical bulk region

Figure 11. Map (EBSD) of as etched sample in streak/bulk interface region. Framed area A represents typical streak region and framed area B represents typical bulk region