Cleaning technology of potassium dihydrogen phosphate crystal by a low-pressure jet

Abstract

Potassium dihydrogen phosphate (KDP) crystal is widely used in the manufacture of electro-optic components. However, the residues such as polishing liquid, abrasives and chips on KDP crystal surface influence severely the surface quality. In this study, the low-pressure liquid jet and air jet are used to clean the residues on KDP crystal surface. The residue absorption mechanisms are studied. The polishing liquid is measured by the infrared spectrometer (VECTOR22) to be butoxydiglycol (C₈H₁₈O₃). The cleaning solvents are determined based on the property of the polishing liquid. The cleaning system of low-pressure liquid jet and air jet is set up. Some cleaning experiments are carried out to testify the cleaning equipment. The results show that the 2D morphology that most particles are removed, and the 3D shape of the KDP crystal is improved greatly after cleaning. The cleaning technology is proved to be feasible for KDP crystal.

Keywords:

• KDP crystal
• Residues
• Cleaning technology
• Liquid jet
• Air jet

Acknowledgements

This work is supported by LPMT, CAEP (KF13002) and National Natural Science Foundation of China (51202228).