Fabrication of Interdigitated Electrodes using Molecular Beam Epitaxy and Optical Lithography

ABSTRACT

This study reports the fabrication of interdigitated electrodes using molecular beam epitaxy and photolithography techniques. Sandwich-based 10 nm silver and 50 nm gold films were deposited on glass substrates using magnetron sputtering and molecular beam epitaxy deposition. The thickness and roughness were determined by use of a suitable mathematical model and ellipsometric measurements. The gold film (111) orientation was determined by X-ray diffraction. Optical microscopy measurements were made for the lateral resolution determination of the fabricated electrodes and the quality was similar to that of the photomask. Atomic force microscopy measurements offered information regarding the topography of the sample and the possible application of the fabricated system for molecular detection.

KEYWORDS:

• Interdigitated electrodes
• molecular beam epitaxy
• photolithography