Ba_xSr_{1 − x}TiO₃ Thin Films Deposited by RF Hollow Cathode Plasma Jet Technique

Abstract

The RF modulated plasma jet system was used for the deposition of Ba _x Sr_{1− x} TiO₃ (BST), and SrTiO₃ (STO) thin films on Si and multi-layer system Si/SiO₂/TiO₂/Pt substrates. BSTO and STO thin films were analyzed using X-ray diffraction. During deposition, the substrate was heated at 500°C. Emission spectroscopy of the plasma was used to control the concentration of sputtered particles from the hollow cathode, mainly Sr and Ba atoms. XRD diffraction confirmed the presence of BSTO and STO perovskite phase in the films. The optical band gap obtained from spectroscopic ellipsometry was correlated with composition.

Keywords:

• Ferroelectric thin films
• hollow cathode sputtering
• emission spectroscopy
• ellipsometry

PACS:

• 77.84Dy
• 81.15.Cd
• 78.20.Ci

Acknowledgment

This work was supported by junior grant KJB1010302 agency ASCR and by junior grant KJB 1010301 agency ASCR and by project AV0Z10100522 of ASCR.