Electron-beam domain patterning on the nonpolar surfaces of lithium niobate crystals

ABSTRACT

We compare electron-beam writing of domains and domain patterns in He-implanted planar optical waveguides fabricated on X-cut LiNbO₃ crystals to the results of domain writing on the nonpolar surfaces in unimplanted LiNbO₃. The characteristics of written patterns, in particular the exposure dependences of the domain length L and spatial regularity of written domain gratings depend on the relation between the domain depth T_d controlled by the acceleration voltages U, and thickness D of the optical barrier, determined by He-ion beam energy. An increased average L in domain gratings as compared to isolated domains is discussed with account for dependence of the electron emission coefficient σ on U.

KEYWORDS:

• Optical waveguides
• He-implantation
• ferroelectric domains
• electron beam
• atomic force microscopy
• lithium niobate

Acknowledgments

These studies are supported by the Russian Foundation for Basic Researches (projects Nos 16-02-00439a and 15-52-53107 GFEN_a). The equipment of the Shared Research Center IC RAS supported by the Ministry of Education and Science (project RFMEFI62114×0005) was used in experiments.