Effects of temperature and impurities on electron radiation damage in the high voltage microscope

Abstract

This paper describes the results of irradiation of specimens of copper and copper containing up to 2 at % beryllium in the high-voltage electron microscope. The results of irradiation at temperatures ranging from 20–500 K are described and discussed in the light of recently proposed theories of defect nucleation. Although the results are difficult to interpret because of the many diverse factors which influence the nucleation and growth of the damage it was found that the values for the volume density of defects were in general agreement with the predictions, if the effects of the foil surfaces were taken into account.

The corrected densities were used to derive values for the activation energy for motion of an interstitial in copper, E_m , and the binding energy between an interstitial and a beryllium atom, E_b . The results obtained were 0.12±0.03 eV for E_m and 0.29±0.07 eV for E_b .