Optimization of photooxidative removal of p-nitrophenol in a spinning disc photoreactor using response surface methodology

Abstract

In this article, response surface methodology (RSM) was used to obtain optimum conditions for removal of p-nitrophenol (PNP) by UV/H₂O₂ process using spinning disk photoreactor (SDP). For this purpose, the effect of five independent variables, the initial concentration of PNP, the initial concentration of H₂O₂, pH, solution volume, and irradiation time on the PNP removal percent, was investigated. Central composite design, one of the response surface techniques used for process optimization. The results showed a good agreement between the RSM predicted and experimental data with “R²” and “Adjusted R²” of 0.9692 and 0.9480, respectively. In addition, “Predicted R²” of 0.8909 is in reasonable agreement with “Adjusted R²” of 0.9488. At optimal conditions, that is, PNP concentration of 20.78 mg L⁻¹, H₂O₂ concentration of 1355.83 mg L⁻¹, solution volume of 566.08 mL, irradiation time of 12.30 min, and pH of 4.59 the removal percent predicted by RSM is 100% which has good correspondence with its experimental value (98.67%).

Keywords:

• Advanced oxidation processes
• Photodegradation
• p-nitrophenol (PNP)
• Response surface methodology (RSM)
• Spinning disk photoreactor (SDP)
• UV/H₂O₂ process

Additional information

Funding

The authors would like to thank the Tabriz Branch, Islamic Azad University for financial support of this work.