34
Views
4
CrossRef citations to date
0
Altmetric
Original Articles

Intercalation compounds: Some recent developments and future trends in mixed conductors

Pages 1101-1112 | Accepted 10 Oct 1990, Published online: 20 Aug 2006
 

Abstract

Intercalation compounds are formed by the injection of guest ions (e.g. Li+) and their charge compensating electrons into a solid host (e.g. TiS2). Such compounds are mixed, ionic and electronic conductors.

Recent developments concerning three aspects of intercalation are discussed in this article.

(1) Ionic diffusion. Results are presented for the self-difusion coefficient of Li+ in both layered and cubic titanium disulphide which permits comparison of Li+ diffusion in two and three dimensions within a chemically identical environment. In both cases the activation energy and pre-exponential factor for self-diffusion exhibit a dramatic variation with Li+ ion content. These variations and possible interpretations are discussed.

(2) Thermodynamics of intercalation. The variation in the chemical potential of lithium in cubic TiS2 is presented and interpreted in terms of interactions between both the ions and electrons; the interactions follow a cube root dependence on composition.

(3) New intercalation compounds. New sodium intercalation compounds are described and the future prospects for other monovalent and divalent cation intercalation compounds discussed.

Reprints and Corporate Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

To request a reprint or corporate permissions for this article, please click on the relevant link below:

Academic Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

Obtain permissions instantly via Rightslink by clicking on the button below:

If you are unable to obtain permissions via Rightslink, please complete and submit this Permissions form. For more information, please visit our Permissions help page.