A study of growth and surface performance analysis of nanographites grown using microwave plasma jet chemical vapor deposition system

Abstract

Nanographites were grown using a microwave plasma jet chemical vapor deposition (MPJCVD) system. The E-H tuner of the MPJCVD was controlled by a personal computer. Monitoring of plasma jet was done through an optical emission spectroscopy and a charge coupled detector camera. High frequency structure simulator software was used to calculate electrical fields around specimens at different positions of the E-H tuner of the MPJCVD. Nanographites, composed of sp² hybrid orbital, were grown at a microwave power of 800 W. The carbon bonds, both C–C and C=C bonds, of as-grown nanographites were measured to have characteristic peaks at 1309 and 1595 cm⁻¹ using Raman spectroscopy. The mean size of the nanostructured graphite was nearly 50 nm under scanning electron microscopy observation. The measurement of contact angle on such graphite films was made by laying drops of deionized (DI) water, 0.03 and 0.09 M sodium chloride (NaCl) and was found to be 153°, 147°, and 136°, respectively. An electro-wetting test was also performed on the graphite films by adding electrical voltage through the CA measurement. It was found that contact angles of electro-wetting test for graphite films become 110° and 37° for DI water and NaCl solution, respectively.

Keywords:

• MPJCVD
• contact angle
• electro-wetting
• nanographites
• HFSS